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Formation of antireflective surfaces

Patent ·
OSTI ID:1924907
; ; ;
Technologies are described for methods and systems effective for etching nanostructures in a substrate. The methods may comprise depositing a patterned block copolymer on the substrate. The patterned block copolymer may include first and second polymer block domains. The methods may comprise applying a precursor to the patterned block copolymer to generate an infiltrated block copolymer. The precursor may infiltrate into the first polymer block domain and generate a material in the first polymer block domain. The methods may comprise applying a removal agent to the infiltrated block copolymer to generate a patterned material. The removal agent may be effective to remove the first and second polymer block domains from the substrate. The methods may comprise etching the substrate. The patterned material on the substrate may mask the substrate to pattern the etching. The etching may be performed under conditions to produce nanostructures in the substrate.
Research Organization:
Brookhaven National Laboratory (BNL), Upton, NY (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC02-98CH10886
Assignee:
Brookhaven Science Associates, LLC (Upton, NY)
Patent Number(s):
11,390,518
Application Number:
17/114,855
OSTI ID:
1924907
Country of Publication:
United States
Language:
English

References (9)

Fabrication of Broadband Antireflective Plasmonic Gold Nanocone Arrays on Flexible Polymer Films journal November 2013
Anti-reflective coatings: A critical, in-depth review journal January 2011
High energy electron fluxes in dc-augmented capacitively coupled plasmas. II. Effects on twisting in high aspect ratio etching of dielectrics journal January 2010
Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis journal July 2011
Ultimate Top-down Etching Processes for Future Nanoscale Devices: Advanced Neutral-Beam Etching journal April 2006
Effect of Cl 2 - and HBr-based inductively coupled plasma etching on InP surface composition analyzed using in situ x-ray photoelectron spectroscopy
  • Bouchoule, S.; Vallier, L.; Patriarche, G.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 30, Issue 3 https://doi.org/10.1116/1.3692751
journal May 2012
Fabrication of Size-Tunable Large-Area Periodic Silicon Nanopillar Arrays with Sub-10-nm Resolution journal September 2003
Block Copolymer Lithography: Periodic Arrays of 1011 Holes in 1 Square Centimeter journal May 1997
A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates journal May 2011

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