One Nanometer HfO[subscript 2]-Based Ferroelectric Tunnel Junctions on Silicon

Cheema, Suraj S.; Shanker, Nirmaan; Hsu, Cheng-Hsiang; Datar, Adhiraj; Bae, Jongho; Kwon, Daewoong; Salahuddin, Sayeef

doi:10.1002/aelm.202100499

One Nanometer HfO[subscript 2]-Based Ferroelectric Tunnel Junctions on Silicon

Journal Article · 01 June 2022 · Adv. Electron. Mater.

DOI:https://doi.org/10.1002/aelm.202100499· OSTI ID:1872597

Cheema, Suraj S.; Shanker, Nirmaan; Hsu, Cheng-Hsiang; Datar, Adhiraj; Bae, Jongho; Kwon, Daewoong; Salahuddin, Sayeef

Research Organization:: Advanced Photon Source (APS), Argonne National Laboratory (ANL), Argonne, IL (US)

Sponsoring Organization:: DOE - Office Of Science; DOE - BASIC ENERGY SCIENCES

OSTI ID:: 1872597

Journal Information:: Adv. Electron. Mater., Journal Name: Adv. Electron. Mater. Journal Issue: (6) Vol. 8

Country of Publication:: United States

Language:: ENGLISH

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