Role of Fluoride Doping in Low-Temperature Combustion-Synthesized ZrO[subscript x] Dielectric Films

Sil, Aritra; Goldfine, Elise A.; Huang, Wei; Bedzyk, Michael J.; Medvedeva, Julia E.; Facchetti, Antonio; Marks, Tobin J.

doi:10.1021/acsami.1c22853

Role of Fluoride Doping in Low-Temperature Combustion-Synthesized ZrO[subscript x] Dielectric Films

Journal Article · 28 February 2022 · ACS Appl. Mater. Interfaces

DOI:https://doi.org/10.1021/acsami.1c22853· OSTI ID:1866459

Sil, Aritra; Goldfine, Elise A.; Huang, Wei; Bedzyk, Michael J.; Medvedeva, Julia E.; Facchetti, Antonio; Marks, Tobin J.

Research Organization:: Advanced Photon Source (APS), Argonne National Laboratory (ANL), Argonne, IL (US)

Sponsoring Organization:: DOE - Office Of Science; DOE - BASIC ENERGY SCIENCES

OSTI ID:: 1866459

Journal Information:: ACS Appl. Mater. Interfaces, Journal Name: ACS Appl. Mater. Interfaces Journal Issue: (10) Vol. 14

Country of Publication:: United States

Language:: ENGLISH

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