Colloidal Nanosurfactants for 3D Conformal Printing of 2D van der Waals Materials

Zeng, Minxiang; Kuang, Wenzheng; Khan, Irfan; Huang, Dali; Du, Yipu; Saeidi‐Javash, Mortaza; Zhang, Lecheng; Cheng, Zhengdong; Hoffman, Anthony J.; Zhang, Yanliang

doi:10.1002/adma.202003081

Title: Colloidal Nanosurfactants for 3D Conformal Printing of 2D van der Waals Materials

Journal Article · Wed Aug 26 00:00:00 EDT 2020 · Advanced Materials

DOI:https://doi.org/10.1002/adma.202003081· OSTI ID:1850531

Zeng, Minxiang ^[1]; Kuang, Wenzheng ^[1]; Khan, Irfan ^[2]; Huang, Dali ^[3]; Du, Yipu ^[1]; Saeidi‐Javash, Mortaza ^[1]; Zhang, Lecheng ^[3]; Cheng, Zhengdong ^[4]; Hoffman, Anthony J. ^[2];

^[1]

Department of Aerospace and Mechanical Engineering University of Notre Dame Notre Dame IN 46556 USA
Department of Electrical Engineering University of Notre Dame Notre Dame IN 46556 USA
Artie McFerrin Department of Chemical Engineering Texas A&,M University College Station TX 77843 USA
Artie McFerrin Department of Chemical Engineering Texas A&,M University College Station TX 77843 USA; Chemical Engineering Department Texas A&,M University at Qatar P.O. Box 23874 Doha Qatar

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Research Organization:: Boise State Univ., ID (United States); Vanderbilt Univ., Nashville, TN (United States)

Sponsoring Organization:: USDOE Office of Nuclear Energy (NE)

DOE Contract Number:: NE0008701; NE0008712

OSTI ID:: 1850531

Journal Information:: Advanced Materials, Vol. 32, Issue 39; ISSN 0935-9648

Publisher:: Wiley

Country of Publication:: United States

Language:: English

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Title: Colloidal Nanosurfactants for 3D Conformal Printing of 2D van der Waals Materials

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