Submonolayer Is Enough: Switching Reaction Channels on Pt/SiO 2 by Atomic Layer Deposition

Tang, Xin; Liu, Chao; Long, Edmund A.; Lin, Wei; Hackler, Ryan A.; Wang, Xiang; Marks, Laurence D.; Notestein, Justin M.; Stair, Peter C.

doi:10.1021/acs.jpcc.1c04972

Submonolayer Is Enough: Switching Reaction Channels on Pt/SiO ₂ by Atomic Layer Deposition

Journal Article · 24 August 2021 · Journal of Physical Chemistry. C

DOI:https://doi.org/10.1021/acs.jpcc.1c04972· OSTI ID:1849444

Tang, Xin ^[1]; Liu, Chao ^[2]; Long, Edmund A. ^[3]; ^[1]; ^[1]; ^[1]; ^[3]; ^[2]; ^[1]

Department of Chemistry, Northwestern University, Evanston, Illinois 60208, United States
Department of Chemical and Biological Engineering, Northwestern University, Evanston, Illinois 60208, United States
Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States

Not provided.

Research Organization:: Northwestern Univ., Evanston, IL (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

DOE Contract Number:: FG02-03ER15457

OSTI ID:: 1849444

Journal Information:: Journal of Physical Chemistry. C, Vol. 125, Issue 34; ISSN 1932-7447

Publisher:: American Chemical Society

Country of Publication:: United States

Language:: English

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