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Method for fabricating superconducting devices using a focused ion beam

Patent ·
OSTI ID:1840263
; ; ;

Nano-scale junctions, wires, and junction arrays are created by using a focused high-energy ion beam to direct-write insulating or poorly conducting barriers into thin films of materials that are sensitive to disorder, including superconductors, ferromagnetic materials and semiconductors.

Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC02-05CH11231
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Number(s):
11,063,201
Application Number:
16/255,499
OSTI ID:
1840263
Country of Publication:
United States
Language:
English

References (13)

Fabrication of MgB2 nanobridge dc SQUIDs by focused ion beam journal December 2010
Very Large Scale Integration of Nanopatterned YBa 2 Cu 3 O 7−δ Josephson Junctions in a Two-Dimensional Array journal October 2009
Nano Josephson superconducting tunnel junctions in YBa2Cu3O7–δ directly patterned with a focused helium ion beam journal April 2015
Comparison of measurements and simulations of series-parallel incommensurate area superconducting quantum interference device arrays fabricated from YBa2Cu3O7−δ ion damage Josephson junctions journal September 2012
YBa 2 Cu 3 O 7− δ superconducting quantum interference devices with metallic to insulating barriers written with a focused helium ion beam journal June 2015
Fabrication of superconducting MgB2nanostructures journal November 2008
Modification and nano-patterning of high-Tcsuperconducting thin films by masked ion beam irradiation journal June 2010
Temporal Stability of Y–Ba–Cu–O Nano Josephson Junctions from Ion Irradiation journal June 2013
Fabrication of Arrays of Nano-Superconducting Quantum Interference Devices Using a Double-Angle Processing Approach journal June 2013
Sub-10-nm nanolithography with a scanning helium beam
  • Sidorkin, Vadim; van Veldhoven, Emile; van der Drift, Emile
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 27, Issue 4 https://doi.org/10.1116/1.3182742
journal January 2009
Nanometer scale high-aspect-ratio trench etching at controllable angles using ballistic reactive ion etching
  • Cybart, Shane A.; Roediger, Peter; Ulin-Avila, Erick
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 31, Issue 1 https://doi.org/10.1116/1.4773919
journal January 2013
Masked ion beam irradiation of high-temperature superconductors: patterning of nano-size regions with high point-defect density journal January 2009
MgB2 SQUID for Magnetocardiography
  • Harada, Yoshitomo; Kobayashi, Koichiro; Yoshizaw, Masahito
  • Superconductors - Properties, Technology, and Applications https://doi.org/10.5772/38652
book April 2012

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