Order of magnitude enhancement of inherently selective atomic layer deposition of zirconia on silico

Saha, Soumya; Jursich, Gregory; Phakatkar, Abhijit H.; Shokuhfar, Tolou; Takoudis, Christos G.

doi:10.1016/j.vacuum.2021.110686

Order of magnitude enhancement of inherently selective atomic layer deposition of zirconia on silico

Journal Article · 01 January 2022 · Vacuum

DOI:https://doi.org/10.1016/j.vacuum.2021.110686· OSTI ID:1837266

Saha, Soumya; Jursich, Gregory; Phakatkar, Abhijit H.; Shokuhfar, Tolou; Takoudis, Christos G.

Research Organization:: Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)

Sponsoring Organization:: DOE - Office Of Science; National Science Foundation (NSF)

OSTI ID:: 1837266

Journal Information:: Vacuum, Vol. 195

Country of Publication:: United States

Language:: ENGLISH

References (35)

A novel thermally-stable zirconium amidinate ALD precursor for ZrO2 thin films Lee, B.; Choi, K. J.; Hande, A. Microelectronic Engineering, Vol. 86, Issue 3 https://doi.org/10.1016/j.mee.2008.03.020	journal	March 2009
Properties of zirconium oxide thin films deposited by pulsed reactive magnetron sputtering Koski, K.; Hölsä, J.; Juliet, P. Surface and Coatings Technology, Vol. 120-121 https://doi.org/10.1016/S0257-8972(99)00501-0	journal	November 1999
Optical properties of zirconium oxide thin films for semitransparent solar cell applications Yoon, Hoi Jin; Bang, Ki Su; Lim, Jung Wook Journal of Materials Science: Materials in Electronics, Vol. 27, Issue 11 https://doi.org/10.1007/s10854-016-5260-4	journal	June 2016
Atomic layer deposition of zirconium oxide from zirconium tetraiodide, water and hydrogen peroxide Kukli, Kaupo; Forsgren, Katarina; Aarik, Jaan Journal of Crystal Growth, Vol. 231, Issue 1-2 https://doi.org/10.1016/S0022-0248(01)01449-X	journal	September 2001
Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors Hausmann, Dennis M.; Kim, Esther; Becker, Jill Chemistry of Materials, Vol. 14, Issue 10 https://doi.org/10.1021/cm020357x	journal	October 2002
Zirconium Oxide Thin Films Obtained by Atomic Layer Deposition Technology Abolish the Anti-Osteogenic Effect Resulting from miR-21 Inhibition in the Pre-Osteoblastic MC3T3 Cell Line Seweryn, Aleksandra; Pielok, Ariadna; Lawniczak-Jablonska, Krystyna International Journal of Nanomedicine, Vol. Volume 15 https://doi.org/10.2147/IJN.S237898	journal	January 2020
Atomic layer deposition of zirconium oxide thin films Wang, Xin; Ghosh, Sujan Kumar; Afshar-Mohajer, Mahyar Journal of Materials Research, Vol. 35, Issue 7 https://doi.org/10.1557/jmr.2019.338	journal	November 2019
Influence of growth temperature on properties of zirconium dioxide films grown by atomic layer deposition Kukli, Kaupo; Ritala, Mikko; Aarik, Jaan Journal of Applied Physics, Vol. 92, Issue 4 https://doi.org/10.1063/1.1493657	journal	August 2002
Surface reaction mechanisms during atomic layer deposition of zirconium oxide using water, ethanol, and water-ethanol mixture as the oxygen sources Xu, Wanxing; Lemaire, Paul C.; Sharma, Kashish Journal of Vacuum Science & Technology A, Vol. 38, Issue 1 https://doi.org/10.1116/1.5122994	journal	January 2020
Optimization of substrate-selective atomic layer deposition of zirconia on electroplated copper using ethanol as both precursor reactant and surface pre-deposition treatment Anderson, Nickolas; Saha, Soumya; Jursich, Gregory Journal of Materials Science: Materials in Electronics, Vol. 32, Issue 5 https://doi.org/10.1007/s10854-021-05267-0	journal	January 2021
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity Mackus, Adriaan J. M.; Merkx, Marc J. M.; Kessels, Wilhelmus M. M. Chemistry of Materials, Vol. 31, Issue 1 https://doi.org/10.1021/acs.chemmater.8b03454	journal	November 2018
Chemistry for Positive Pattern Transfer Using Area-Selective Atomic Layer Deposition Chen, R.; Bent, S. F. Advanced Materials, Vol. 18, Issue 8 https://doi.org/10.1002/adma.200502470	journal	April 2006
Inherently Selective Atomic Layer Deposition and Applications Cao, Kun; Cai, Jiaming; Chen, Rong Chemistry of Materials, Vol. 32, Issue 6 https://doi.org/10.1021/acs.chemmater.9b04647	journal	February 2020
The dependence of silicon selective epitaxial growth rates on masking oxide thickness Friedrich, J. A.; Kastelic, M.; Neudeck, G. W. Journal of Applied Physics, Vol. 65, Issue 4 https://doi.org/10.1063/1.342943	journal	February 1989
Selective epitaxial growth of silicon in pancake reactors Kastelic, M.; Oh, I.; Takoudis, C. G. Chemical Engineering Science, Vol. 43, Issue 8 https://doi.org/10.1016/0009-2509(88)87080-5	journal	January 1988
Selective epitaxial growth of silicon in a barrel reactor Takoudis, C. G.; Kastelic, M. M. Chemical Engineering Science, Vol. 44, Issue 9 https://doi.org/10.1016/0009-2509(89)85141-3	journal	January 1989
Integrated Isothermal Atomic Layer Deposition/Atomic Layer Etching Supercycles for Area-Selective Deposition of TiO ₂ Song, Seung Keun; Saare, Holger; Parsons, Gregory N. Chemistry of Materials, Vol. 31, Issue 13 https://doi.org/10.1021/acs.chemmater.9b01143	journal	June 2019
Atomic Layer Deposition and Characterization of Amorphous Er _x Ti _1-x O _y Dielectric Ultra-Thin Films Xu, Runshen; Takoudis, Christos G. ECS Journal of Solid State Science and Technology, Vol. 1, Issue 6 https://doi.org/10.1149/2.013206jss	journal	January 2012
Oxidation of copper in controlled clean air and standard laboratory air at 50°C to 150°C Pinnel, M. R.; Tompkins, H. G.; Heath, D. E. Applications of Surface Science, Vol. 2, Issue 4 https://doi.org/10.1016/0378-5963(79)90047-3	journal	May 1979
Selective atomic layer deposition of zirconia on copper patterned silicon substrates using ethanol as oxygen source as well as copper reductant Kannan Selvaraj, Sathees; Parulekar, Jaya; Takoudis, Christos G. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 32, Issue 1 https://doi.org/10.1116/1.4826941	journal	January 2014
Reliable determination of chemical state in x-ray photoelectron spectroscopy based on sample-work-function referencing to adventitious carbon: Resolving the myth of apparent constant binding energy of the C 1s peak Greczynski, G.; Hultman, L. Applied Surface Science, Vol. 451 https://doi.org/10.1016/j.apsusc.2018.04.226	journal	September 2018
C 1s Peak of Adventitious Carbon Aligns to the Vacuum Level: Dire Consequences for Material's Bonding Assignment by Photoelectron Spectroscopy Greczynski, Grzegorz; Hultman, Lars ChemPhysChem, Vol. 18, Issue 12 https://doi.org/10.1002/cphc.201700126	journal	April 2017
ATHENA , ARTEMIS , HEPHAESTUS : data analysis for X-ray absorption spectroscopy using IFEFFIT Ravel, B.; Newville, M. Journal of Synchrotron Radiation, Vol. 12, Issue 4 https://doi.org/10.1107/S0909049505012719	journal	June 2005
tert -butoxides as precursors for atomic layer deposition of alkali metal containing thin films Sønsteby, Henrik H.; Bratvold, Jon E.; Killi, Veronica A. -L. K. Journal of Vacuum Science & Technology A, Vol. 38, Issue 6 https://doi.org/10.1116/6.0000589	journal	December 2020
An EXAFS Study of Nanocrystalline Yttrium Stabilized Cubic Zirconia Films and Pure Zirconia Powders Rush, Georgina E.; Chadwick, Alan V.; Kosacki, Igor The Journal of Physical Chemistry B, Vol. 104, Issue 41 https://doi.org/10.1021/jp001105r	journal	October 2000
X-ray-absorption studies of zirconia polymorphs. I. Characteristic local structures Li, Ping; Chen, I-Wei; Penner-Hahn, James E. Physical Review B, Vol. 48, Issue 14 https://doi.org/10.1103/PhysRevB.48.10063	journal	October 1993
X-ray-absorption studies of zirconia polymorphs. II. Effect of Y 2 O 3 dopant on ZrO 2 structure Li, Ping; Chen, I-Wei; Penner-Hahn, James E. Physical Review B, Vol. 48, Issue 14 https://doi.org/10.1103/PhysRevB.48.10074	journal	October 1993
EXAFS study of zirconium alkoxides as precursors in the sol-gel process: II. The influence of the chemical modification Peter, D.; Ertel, T. S.; Bertagnolli, H. Journal of Sol-Gel Science and Technology, Vol. 5, Issue 1 https://doi.org/10.1007/BF00486706	journal	February 1995
Atomic force microscopy study of titanium dioxide thin films grown by atomic layer epitaxy Ritala, Mikko; Leskelä, Markku; Johansson, Leena-Sisko Thin Solid Films, Vol. 228, Issue 1-2 https://doi.org/10.1016/0040-6090(93)90557-6	journal	May 1993
XANES and EXAFS study of the local order in nanocrystalline yttria-stabilized zirconia Dura, O. J.; Boada, R.; López de la Torre, M. A. Physical Review B, Vol. 87, Issue 17 https://doi.org/10.1103/PhysRevB.87.174109	journal	May 2013
The Rate of Oxidation of Copper at Room Temperature White, Addison H.; Germer, Lester H. Transactions of The Electrochemical Society, Vol. 81, Issue 1 https://doi.org/10.1149/1.3071381	journal	January 1942
CuOX thin films by direct oxidation of Cu films deposited by physical vapor deposition Santos-Cruz, D.; Mayén-Hernández, S. A.; de Moure-Flores, F. Results in Physics, Vol. 7 https://doi.org/10.1016/j.rinp.2017.10.022	journal	January 2017
Crystallization and electrical resistivity of Cu2O and CuO obtained by thermal oxidation of Cu thin films on SiO2/Si substrates De Los Santos Valladares, L.; Salinas, D. Hurtado; Dominguez, A. Bustamante Thin Solid Films, Vol. 520, Issue 20 https://doi.org/10.1016/j.tsf.2012.06.043	journal	August 2012
Low-Temperature Deposition of Zirconium Oxide-Based Nanocrystalline Films by Alternate Supply of Zr[OC(CH3)3]4 and H2O Kukli, K.; Ritala, M.; Leskelä, M. Chemical Vapor Deposition, Vol. 6, Issue 6 https://doi.org/10.1002/1521-3862(200011)6:6<297::AID-CVDE297>3.0.CO;2-8	journal	November 2000
Why Can’t We See Hydrogen in X-ray Photoelectron Spectroscopy? Stojilovic, Nenad Journal of Chemical Education, Vol. 89, Issue 10 https://doi.org/10.1021/ed300057j	journal	July 2012

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