Fabrication of Poly-Si on Locally Etched SiOx as Passivating Contacts for c-Si Solar Cells
Polysilicon on silicon oxide (poly-Si/SiO x ) passivating contacts with predominant charge-carrier transport via pinholes were prepared with room temperature metal-assisted chemical etching. Pinhole areal densities in the range of 2.8 x 10^4 to 4.5 x 10^7 cm^-2 were imaged by SEM. Contact resistivity of 32 m-ohm-cm^2 and implied open circuit voltage of 729 mV were obtained for symmetric n+ poly-Si/SiOx grown onto randomly textured n-Cz. We also show preliminary data pertaining boron-doped polysilicon on nitride/oxide passivating contacts, with which we achieved implied open circuit voltage above 730 mV and recombination current of 0.2 fA/cm^2.
- Research Organization:
- National Renewable Energy Lab. (NREL), Golden, CO (United States)
- Sponsoring Organization:
- USDOE Office of Energy Efficiency and Renewable Energy (EERE)
- DOE Contract Number:
- AC36-08GO28308
- OSTI ID:
- 1826674
- Report Number(s):
- NREL/CP-5900-81261; MainId:82034; UUID:1ff45516-4cba-4999-a753-64bd8bf5fa6c; MainAdminID:63216
- Resource Relation:
- Conference: Presented at the 2021 IEEE 48th Photovoltaic Specialists Conference (PVSC), 20-25 June 2021
- Country of Publication:
- United States
- Language:
- English
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