Investigation of Current-Driven Degradation of 1.3 μm Quantum-Dot Lasers Epitaxially Grown on Silicon
- Univ. of Padova (Italy)
- Korea Inst. of Science and Technology, Seoul (Korea, Republic of)
- Univ. of California, Santa Barbara, CA (United States)
- Intel Corporation, Santa Clara, CA (United States)
This work investigates the degradation processes affecting the long-term reliability of 1.3 μm InAs quantum-dot lasers epitaxially grown on silicon. By submitting laser samples to constant-current stress, we were able to identify the physical mechanisms responsible for the optical degradation. More specifically, the samples (i) exhibited a gradual increase in threshold current, well correlated with (ii) a decrease in sub-threshold emission, and (iii) a decrease in slope efficiency. These variations were found to be compatible with a diffusion process involving the propagation of defects toward the active region of the device and the subsequent decrease in injection efficiency. This hypothesis was also supported by the increase in the defect-related current conduction components exhibited by the electrical characteristics, and highlights the role of defects in the gradual degradation of InAs quantum dot laser diodes. Electroluminescence measurements were used to provide further insight in the degradation process.
- Research Organization:
- Univ. of California, Santa Barbara, CA (United States)
- Sponsoring Organization:
- USDOE Advanced Research Projects Agency - Energy (ARPA-E)
- Grant/Contract Number:
- AR0000671
- OSTI ID:
- 1803986
- Journal Information:
- IEEE Journal of Selected Topics in Quantum Electronics, Vol. 26, Issue 2; ISSN 1077-260X
- Publisher:
- IEEE Lasers and Electro-optics SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Epitaxial quantum dot lasers on silicon with high thermal stability and strong resistance to optical feedback
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journal | January 2020 |
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