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Office of Scientific and Technical Information
 

Optimization of substrate-selective atomic layer deposition of zirconia on electroplated copper usin

Journal Article · · J. Mater. Sci.
; ; ;

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Organization:
DOE - Office Of Science; National Science Foundation (NSF)
OSTI ID:
1783906
Journal Information:
J. Mater. Sci., Vol. 32
Country of Publication:
United States
Language:
ENGLISH

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