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Title: Protection layers for metal anodes

Abstract

A protection layer is formed on a highly-reactive substantially-pure metal anode to a thickness of between 1 nm and 200 nm, inclusive, using atomic layer deposition (ALD). The ALD protection layer allows the conduction of ions of the metal of the anode therethrough but suppresses electron transport therethrough. The ALD protection layer may also be effective to inhibit passage of air and/or water therethrough. The ALD protection layer can allow more relaxed purity requirements for subsequent battery assembly, electrolyte specifications, and/or cathode gas purity. Fabrication methods for the protection layers, protected metal anodes, and systems and devices incorporating such protected metal anodes are also disclosed herein.

Inventors:
; ; ; ; ;
Publication Date:
Research Org.:
Univ. of Maryland, College Park, MD (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1771589
Patent Number(s):
10,826,065
Application Number:
15/517,126
Assignee:
University of Maryland, College Park (College Park, MD)
DOE Contract Number:  
SC0001160
Resource Type:
Patent
Resource Relation:
Patent File Date: 10/05/2015
Country of Publication:
United States
Language:
English

Citation Formats

Kozen, Alexander C., Schroeder, Marshall A., Rubloff, Gary W., Hu, Liangbing, Noked, Malakhi, and Lee, Sang Bok. Protection layers for metal anodes. United States: N. p., 2020. Web.
Kozen, Alexander C., Schroeder, Marshall A., Rubloff, Gary W., Hu, Liangbing, Noked, Malakhi, & Lee, Sang Bok. Protection layers for metal anodes. United States.
Kozen, Alexander C., Schroeder, Marshall A., Rubloff, Gary W., Hu, Liangbing, Noked, Malakhi, and Lee, Sang Bok. 2020. "Protection layers for metal anodes". United States. https://www.osti.gov/servlets/purl/1771589.
@article{osti_1771589,
title = {Protection layers for metal anodes},
author = {Kozen, Alexander C. and Schroeder, Marshall A. and Rubloff, Gary W. and Hu, Liangbing and Noked, Malakhi and Lee, Sang Bok},
abstractNote = {A protection layer is formed on a highly-reactive substantially-pure metal anode to a thickness of between 1 nm and 200 nm, inclusive, using atomic layer deposition (ALD). The ALD protection layer allows the conduction of ions of the metal of the anode therethrough but suppresses electron transport therethrough. The ALD protection layer may also be effective to inhibit passage of air and/or water therethrough. The ALD protection layer can allow more relaxed purity requirements for subsequent battery assembly, electrolyte specifications, and/or cathode gas purity. Fabrication methods for the protection layers, protected metal anodes, and systems and devices incorporating such protected metal anodes are also disclosed herein.},
doi = {},
url = {https://www.osti.gov/biblio/1771589}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 03 00:00:00 EST 2020},
month = {Tue Nov 03 00:00:00 EST 2020}
}

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