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Title: Method of manufacturing image sensor including nanostructure color filter

Abstract

A method of manufacturing an image sensor includes: preparing a sensor substrate including: a sensor layer including a photosensitive cell; and a signal line layer including lines to receive electric signals from the photosensitive cell; forming a first material layer having a first refractive index on the sensor substrate; and forming a nanopattern layer on the first material layer, the nanopattern layer including a material having a second refractive index different from the first refractive index.

Inventors:
; ; ; ; ; ;
Publication Date:
Research Org.:
Samsung Electronics Co., Ltd., Suwon-si (Korea); California Inst. of Technology, Pasadena, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1576262
Patent Number(s):
10,431,624
Application Number:
15/193,229
Assignee:
Samsung Electronics Co., Ltd. (Suwon-si, KR); California Institute of Technology (Pasadena, CA)
DOE Contract Number:  
SC0001293; W911NF-14-1-0345
Resource Type:
Patent
Resource Relation:
Patent File Date: 2016 Jun 27
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; 36 MATERIALS SCIENCE; 77 NANOSCIENCE AND NANOTECHNOLOGY

Citation Formats

Han, Seunghoon, Kim, Yongsung, Kamali, Seyedeh Mahsa, Arbabi, Amir, Horie, Yu, Faraon, Andrei, and Hwang, Sungwoo. Method of manufacturing image sensor including nanostructure color filter. United States: N. p., 2019. Web.
Han, Seunghoon, Kim, Yongsung, Kamali, Seyedeh Mahsa, Arbabi, Amir, Horie, Yu, Faraon, Andrei, & Hwang, Sungwoo. Method of manufacturing image sensor including nanostructure color filter. United States.
Han, Seunghoon, Kim, Yongsung, Kamali, Seyedeh Mahsa, Arbabi, Amir, Horie, Yu, Faraon, Andrei, and Hwang, Sungwoo. Tue . "Method of manufacturing image sensor including nanostructure color filter". United States. https://www.osti.gov/servlets/purl/1576262.
@article{osti_1576262,
title = {Method of manufacturing image sensor including nanostructure color filter},
author = {Han, Seunghoon and Kim, Yongsung and Kamali, Seyedeh Mahsa and Arbabi, Amir and Horie, Yu and Faraon, Andrei and Hwang, Sungwoo},
abstractNote = {A method of manufacturing an image sensor includes: preparing a sensor substrate including: a sensor layer including a photosensitive cell; and a signal line layer including lines to receive electric signals from the photosensitive cell; forming a first material layer having a first refractive index on the sensor substrate; and forming a nanopattern layer on the first material layer, the nanopattern layer including a material having a second refractive index different from the first refractive index.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {10}
}

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Works referenced in this record:

Solid-state image sensor and imaging system
patent, June 2010


Photodiodes, image sensing devices and image sensors
patent, April 2012


Image sensor with multilayer interference filters
patent, December 2012