Method of manufacturing image sensor including nanostructure color filter
Patent
·
OSTI ID:1576262
A method of manufacturing an image sensor includes: preparing a sensor substrate including: a sensor layer including a photosensitive cell; and a signal line layer including lines to receive electric signals from the photosensitive cell; forming a first material layer having a first refractive index on the sensor substrate; and forming a nanopattern layer on the first material layer, the nanopattern layer including a material having a second refractive index different from the first refractive index.
- Research Organization:
- Samsung Electronics Co., Ltd., Suwon-si (Korea); California Inst. of Technology, Pasadena, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- SC0001293
- Assignee:
- Samsung Electronics Co., Ltd. (Suwon-si, KR); California Institute of Technology (Pasadena, CA)
- Patent Number(s):
- 10,431,624
- Application Number:
- 15/193,229
- OSTI ID:
- 1576262
- Country of Publication:
- United States
- Language:
- English
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