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Title: How far does the defect tolerance of lead-halide perovskites range? The example of Bi impurities introducing efficient recombination centers

Journal Article · · Journal of Materials Chemistry. A
DOI:https://doi.org/10.1039/C9TA01744E· OSTI ID:1575035
 [1];  [2]; ORCiD logo [3]; ORCiD logo [4]; ORCiD logo [5];  [6]; ORCiD logo [7];  [2];  [5];  [8];  [9]; ORCiD logo [9];  [6]; ORCiD logo [10]; ORCiD logo [11];  [12];  [7]; ORCiD logo [6]; ORCiD logo [2]
  1. École Polytechnique Fédérale de Lausanne; Laboratory of Photomolecular Science; CH-1015 Lausanne; Switzerland; Department of Chemistry
  2. École Polytechnique Fédérale de Lausanne; Laboratory of Photomolecular Science; CH-1015 Lausanne; Switzerland
  3. Department of Mechanical and Aerospace Engineering; University of Rome “Sapienza”; 00184 Roma; Italy
  4. École Polytechnique Fédérale de Lausanne; Laboratory of Photomolecular Science; CH-1015 Lausanne; Switzerland; Department of Electrical and Electronic Engineering
  5. Photovoltaics and Thin-Film Electronics Laboratory (PV-Lab); Institute of Microengineering (IMT); École Polytechnique Fédérale de Lausanne (EPFL); Neuchâtel 2002; Switzerland
  6. Massachusetts Institute of Technology; Cambridge; USA
  7. Department of Chemistry; University of Cologne; 50939 Cologne; Germany
  8. Departamento de Química; Universidad Nacional de Río Cuarto; Córdoba; Argentina
  9. Experimental Physics VI; Julius Maximilian University of Würzburg; 97074 Würzburg; Germany
  10. Department of Electrical and Electronic Engineering; The University of Hong Kong; Hong Kong SAR; China
  11. Dipartimento di Fisica; Università di Cagliari; Consiglio Nazionale delle Ricerche CNR-IOM; Cittadella Universitaria; Monserrato 09042-I (CA)
  12. Institut für Siliziumphotovoltaik; Helmholtz-Zentrum Berlin für Materialien and Energie GmbH; 12489 Berlin; Germany

Experimental and theoretical study on the effect of shallow and deep defects on photovoltaic performance, luminescence, surface photovoltage, and density of states.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Organization:
FOREIGN
OSTI ID:
1575035
Journal Information:
Journal of Materials Chemistry. A, Vol. 7, Issue 41; ISSN 2050-7488
Publisher:
Royal Society of Chemistry
Country of Publication:
United States
Language:
ENGLISH

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