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Title: Title: Optimal contact photolithography technqiues for HEMT substrates using I-line photoresist.

Abstract

Abstract not provided.

Authors:
; ; ; ; ; ; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1573671
Report Number(s):
SAND2018-12015C
668939
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: Proposed for presentation at the 65th Annual AVS conference in Long Beach, California, United States from 10/21/2018 - 05/26/2018 held October 21-26, 2018 in Long Beach, California, United States of America.
Country of Publication:
United States
Language:
English

Citation Formats

Ingram, Whitney, Ingram, Whitney, Jones, Adam, Jones, Adam, Klein, Brianna Alexandra, Klein, Brianna Alexandra, Baca, Albert, Baca, Albert, Armstrong, Andrew, Armstrong, Andrew, Allerman, Andrew A., Allerman, Andrew A., Douglas, Erica Ann, and Douglas, Erica Ann. Title: Optimal contact photolithography technqiues for HEMT substrates using I-line photoresist.. United States: N. p., 2018. Web.
Ingram, Whitney, Ingram, Whitney, Jones, Adam, Jones, Adam, Klein, Brianna Alexandra, Klein, Brianna Alexandra, Baca, Albert, Baca, Albert, Armstrong, Andrew, Armstrong, Andrew, Allerman, Andrew A., Allerman, Andrew A., Douglas, Erica Ann, & Douglas, Erica Ann. Title: Optimal contact photolithography technqiues for HEMT substrates using I-line photoresist.. United States.
Ingram, Whitney, Ingram, Whitney, Jones, Adam, Jones, Adam, Klein, Brianna Alexandra, Klein, Brianna Alexandra, Baca, Albert, Baca, Albert, Armstrong, Andrew, Armstrong, Andrew, Allerman, Andrew A., Allerman, Andrew A., Douglas, Erica Ann, and Douglas, Erica Ann. Mon . "Title: Optimal contact photolithography technqiues for HEMT substrates using I-line photoresist.". United States. https://www.osti.gov/servlets/purl/1573671.
@article{osti_1573671,
title = {Title: Optimal contact photolithography technqiues for HEMT substrates using I-line photoresist.},
author = {Ingram, Whitney and Ingram, Whitney and Jones, Adam and Jones, Adam and Klein, Brianna Alexandra and Klein, Brianna Alexandra and Baca, Albert and Baca, Albert and Armstrong, Andrew and Armstrong, Andrew and Allerman, Andrew A. and Allerman, Andrew A. and Douglas, Erica Ann and Douglas, Erica Ann},
abstractNote = {Abstract not provided.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2018},
month = {10}
}

Conference:
Other availability
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