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Title: Dispersity and architecture driven self-assembly and confined crystallization of symmetric branched block copolymers

Authors:
; ; ;  [1]
  1. UMM
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Org.:
National Science Foundation (NSF)
OSTI Identifier:
1573395
Resource Type:
Journal Article
Journal Name:
Polym. Chem. - UK
Additional Journal Information:
Journal Volume: 10; Journal Issue: (39) ; 2019
Country of Publication:
United States
Language:
ENGLISH

Citation Formats

Pitet, Louis M., Chamberlain, Bradley M., Hauser, Adam W., and Hillmyer, Marc A. Dispersity and architecture driven self-assembly and confined crystallization of symmetric branched block copolymers. United States: N. p., 2019. Web. doi:10.1039/C9PY01173K.
Pitet, Louis M., Chamberlain, Bradley M., Hauser, Adam W., & Hillmyer, Marc A. Dispersity and architecture driven self-assembly and confined crystallization of symmetric branched block copolymers. United States. doi:10.1039/C9PY01173K.
Pitet, Louis M., Chamberlain, Bradley M., Hauser, Adam W., and Hillmyer, Marc A. Tue . "Dispersity and architecture driven self-assembly and confined crystallization of symmetric branched block copolymers". United States. doi:10.1039/C9PY01173K.
@article{osti_1573395,
title = {Dispersity and architecture driven self-assembly and confined crystallization of symmetric branched block copolymers},
author = {Pitet, Louis M. and Chamberlain, Bradley M. and Hauser, Adam W. and Hillmyer, Marc A.},
abstractNote = {},
doi = {10.1039/C9PY01173K},
journal = {Polym. Chem. - UK},
number = (39) ; 2019,
volume = 10,
place = {United States},
year = {2019},
month = {11}
}