Femtosecond laser-induced formation of submicrometer spikes on a semiconductor substrate
Patent
·
OSTI ID:1568634
The present invention generally provides semiconductor substrates having submicron-sized surface features generated by irradiating the surface with ultra short laser pulses. In one aspect, a method of processing a semiconductor substrate is disclosed that includes placing at least a portion of a surface of the substrate in contact with a fluid, and exposing that surface portion to one or more femtosecond pulses so as to modify the topography of that portion. The modification can include, e.g., generating a plurality of submicron-sized spikes in an upper layer of the surface.
- Research Organization:
- Harvard College, Cambridge, MA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FG36-01GO11053
- Assignee:
- President and Fellows of Harvard College (Cambridge, MA)
- Patent Number(s):
- 10,361,083
- Application Number:
- 14/836,609
- OSTI ID:
- 1568634
- Country of Publication:
- United States
- Language:
- English
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