Nanoparticle deposition in porous and on planar substrates
Patent
·
OSTI ID:1568328
A method of preparing a metal nanoparticle on a surface includes subjecting a metal source to a temperature and a pressure in a carrier gas selected to provide a vapor metal species at a vapor pressure in the range of about 10−4 to about 10−11 atm; contacting the vapor metal species with a heated substrate; and depositing the metal as a nanoparticle on the substrate.
- Research Organization:
- Boston Univ., Boston, MA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FE0026096
- Assignee:
- Trustees of Boston University (Boston, MA)
- Patent Number(s):
- 10,287,701
- Application Number:
- 15/654,152
- OSTI ID:
- 1568328
- Country of Publication:
- United States
- Language:
- English
Similar Records
Process for preparing superconducting films by radio-frequency generated aerosol-plasma deposition in atmosphere
Process for depositing an oxide epitaxially onto a silicon substrate and structures prepared with the process
ZnO/Cu(InGa)Se2 solar cells prepared by vapor phase Zn doping
Patent
·
1992
·
OSTI ID:7012788
Process for depositing an oxide epitaxially onto a silicon substrate and structures prepared with the process
Patent
·
1993
·
OSTI ID:6135619
ZnO/Cu(InGa)Se2 solar cells prepared by vapor phase Zn doping
Patent
·
2007
·
OSTI ID:1176116