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Title: Surface and subsurface film growth of titanium dioxide on polydimethylsiloxane by atomic layer deposition

Authors:
; ; ;  [1]
  1. UIC
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Org.:
National Science Foundation (NSF)
OSTI Identifier:
1557299
Resource Type:
Journal Article
Journal Name:
Appl. Surf. Sci.
Additional Journal Information:
Journal Volume: 493; Journal Issue: 11, 2019
Country of Publication:
United States
Language:
ENGLISH

Citation Formats

Astaneh, Sarah Hashemi, Jursich, Gregory, Sukotjo, Cortino, and Takoudis, Christos G. Surface and subsurface film growth of titanium dioxide on polydimethylsiloxane by atomic layer deposition. United States: N. p., 2019. Web. doi:10.1016/j.apsusc.2019.07.029.
Astaneh, Sarah Hashemi, Jursich, Gregory, Sukotjo, Cortino, & Takoudis, Christos G. Surface and subsurface film growth of titanium dioxide on polydimethylsiloxane by atomic layer deposition. United States. doi:10.1016/j.apsusc.2019.07.029.
Astaneh, Sarah Hashemi, Jursich, Gregory, Sukotjo, Cortino, and Takoudis, Christos G. Mon . "Surface and subsurface film growth of titanium dioxide on polydimethylsiloxane by atomic layer deposition". United States. doi:10.1016/j.apsusc.2019.07.029.
@article{osti_1557299,
title = {Surface and subsurface film growth of titanium dioxide on polydimethylsiloxane by atomic layer deposition},
author = {Astaneh, Sarah Hashemi and Jursich, Gregory and Sukotjo, Cortino and Takoudis, Christos G.},
abstractNote = {},
doi = {10.1016/j.apsusc.2019.07.029},
journal = {Appl. Surf. Sci.},
number = 11, 2019,
volume = 493,
place = {United States},
year = {2019},
month = {8}
}