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Title: Stable Silicene in Graphene/Silicene Van der Waals Heterostructures

Abstract

Silicene‐based van der Waals heterostructures are theoretically predicted to have interesting physical properties, but their experimental fabrication has remained a challenge because of the easy oxidation of silicene in air. Here, the fabrication of graphene/silicene van der Waals heterostructures by silicon intercalation is reported. Density functional theory calculations show weak interactions between graphene and silicene layers, confirming the formation of van der Waals heterostructures. The heterostructures show no observable damage after air exposure for extended periods, indicating good air stability. The I–V characteristics of the vertical graphene/silicene/Ru heterostructures show rectification behavior.

Authors:
 [1];  [2];  [2];  [2];  [2];  [2];  [2];  [2];  [2];  [3];  [2];  [4];  [5];  [2]
  1. Institute of Physics and University of Chinese Academy of Sciences, and CAS Center for Excellence in Topological Quantum Computation, Chinese Academy of Sciences, Beijing 100190 China; Department of Physics, University of Maryland, MD 20742 USA
  2. Institute of Physics and University of Chinese Academy of Sciences, and CAS Center for Excellence in Topological Quantum Computation, Chinese Academy of Sciences, Beijing 100190 China
  3. Institute of Physics and University of Chinese Academy of Sciences, and CAS Center for Excellence in Topological Quantum Computation, Chinese Academy of Sciences, Beijing 100190 China; Department of Physics and Astronomy and Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville TN 37235 USA
  4. Department of Physics, University of Maryland, MD 20742 USA
  5. Department of Physics and Astronomy and Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville TN 37235 USA
Publication Date:
Research Org.:
Lawrence Berkeley National Laboratory-National Energy Research Scientific Computing Center (NERSC); Univ. of California, Oakland, CA (United States); Vanderbilt Univ., Nashville, TN (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22). Scientific User Facilities Division
OSTI Identifier:
1543460
DOE Contract Number:  
AC02-05CH11231; FG02-09ER46554
Resource Type:
Journal Article
Journal Name:
Advanced Materials
Additional Journal Information:
Journal Volume: 30; Journal Issue: 49; Journal ID: ISSN 0935-9648
Publisher:
Wiley
Country of Publication:
United States
Language:
English
Subject:
Chemistry; Science & Technology - Other Topics; Materials Science; Physics

Citation Formats

Li, Geng, Zhang, Lizhi, Xu, Wenyan, Pan, Jinbo, Song, Shiru, Zhang, Yi, Zhou, Haitao, Wang, Yeliang, Bao, Lihong, Zhang, Yu-Yang, Du, Shixuan, Ouyang, Min, Pantelides, Sokrates T., and Gao, Hong-Jun. Stable Silicene in Graphene/Silicene Van der Waals Heterostructures. United States: N. p., 2018. Web. doi:10.1002/adma.201804650.
Li, Geng, Zhang, Lizhi, Xu, Wenyan, Pan, Jinbo, Song, Shiru, Zhang, Yi, Zhou, Haitao, Wang, Yeliang, Bao, Lihong, Zhang, Yu-Yang, Du, Shixuan, Ouyang, Min, Pantelides, Sokrates T., & Gao, Hong-Jun. Stable Silicene in Graphene/Silicene Van der Waals Heterostructures. United States. doi:10.1002/adma.201804650.
Li, Geng, Zhang, Lizhi, Xu, Wenyan, Pan, Jinbo, Song, Shiru, Zhang, Yi, Zhou, Haitao, Wang, Yeliang, Bao, Lihong, Zhang, Yu-Yang, Du, Shixuan, Ouyang, Min, Pantelides, Sokrates T., and Gao, Hong-Jun. Mon . "Stable Silicene in Graphene/Silicene Van der Waals Heterostructures". United States. doi:10.1002/adma.201804650.
@article{osti_1543460,
title = {Stable Silicene in Graphene/Silicene Van der Waals Heterostructures},
author = {Li, Geng and Zhang, Lizhi and Xu, Wenyan and Pan, Jinbo and Song, Shiru and Zhang, Yi and Zhou, Haitao and Wang, Yeliang and Bao, Lihong and Zhang, Yu-Yang and Du, Shixuan and Ouyang, Min and Pantelides, Sokrates T. and Gao, Hong-Jun},
abstractNote = {Silicene‐based van der Waals heterostructures are theoretically predicted to have interesting physical properties, but their experimental fabrication has remained a challenge because of the easy oxidation of silicene in air. Here, the fabrication of graphene/silicene van der Waals heterostructures by silicon intercalation is reported. Density functional theory calculations show weak interactions between graphene and silicene layers, confirming the formation of van der Waals heterostructures. The heterostructures show no observable damage after air exposure for extended periods, indicating good air stability. The I–V characteristics of the vertical graphene/silicene/Ru heterostructures show rectification behavior.},
doi = {10.1002/adma.201804650},
journal = {Advanced Materials},
issn = {0935-9648},
number = 49,
volume = 30,
place = {United States},
year = {2018},
month = {10}
}

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