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Title: Role of the dense amorphous carbon layer in photoresist etching

Abstract

Not provided.

Authors:
 [1];  [2];  [2];  [3];  [1]
  1. Department of Materials Science and Engineering, Institute for Research in Electronics and Applied Physics, University of Maryland, College Park, Maryland 20742
  2. Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20742
  3. Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20742, Institute for Physical Science and Technology, University of Maryland, College Park, Maryland 20742, and Center for Nanophysics and Advanced Materials, University of Maryland, College Park, Maryland 20742
Publication Date:
Research Org.:
Univ. of Michigan, Ann Arbor, MI (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1541662
DOE Contract Number:  
SC0001939
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 36; Journal Issue: 2; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English
Subject:
Materials Science; Physics

Citation Formats

Pranda, Adam, Gutierrez Razo, Sandra A., Tomova, Zuleykhan, Fourkas, John T., and Oehrlein, Gottlieb S. Role of the dense amorphous carbon layer in photoresist etching. United States: N. p., 2018. Web. doi:10.1116/1.5009640.
Pranda, Adam, Gutierrez Razo, Sandra A., Tomova, Zuleykhan, Fourkas, John T., & Oehrlein, Gottlieb S. Role of the dense amorphous carbon layer in photoresist etching. United States. doi:10.1116/1.5009640.
Pranda, Adam, Gutierrez Razo, Sandra A., Tomova, Zuleykhan, Fourkas, John T., and Oehrlein, Gottlieb S. Thu . "Role of the dense amorphous carbon layer in photoresist etching". United States. doi:10.1116/1.5009640.
@article{osti_1541662,
title = {Role of the dense amorphous carbon layer in photoresist etching},
author = {Pranda, Adam and Gutierrez Razo, Sandra A. and Tomova, Zuleykhan and Fourkas, John T. and Oehrlein, Gottlieb S.},
abstractNote = {Not provided.},
doi = {10.1116/1.5009640},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
issn = {0734-2101},
number = 2,
volume = 36,
place = {United States},
year = {2018},
month = {3}
}