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Title: Thermal adsorption-enhanced atomic layer etching of Si 3 N 4

Abstract

Not provided.

Authors:
 [1];  [2];  [2];  [2];  [2];  [2];  [3]
  1. Department of Chemical Engineering, Stanford University, 443 Via Ortega, Stanford, California 94305 and Division of Advanced Materials Engineering, Chonbuk National University, Jeonbuk 54896, South Korea
  2. Samsung Electronics, Manufacturing Technology Center, San 1-1 Banwol-Dong, Hwasung-Si, Gyeonggi-Do 445-330, South Korea
  3. Department of Chemical Engineering, Stanford University, 443 Via Ortega, Stanford, California 94305
Publication Date:
Research Org.:
Stanford Univ., CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1541660
DOE Contract Number:  
SC0004782
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 36; Journal Issue: 1; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English
Subject:
Materials Science; Physics

Citation Formats

Kim, Woo-Hee, Sung, Dougyong, Oh, Sejin, Woo, Jehun, Lim, Seungkyu, Lee, Hyunju, and Bent, Stacey F. Thermal adsorption-enhanced atomic layer etching of Si 3 N 4. United States: N. p., 2018. Web. doi:10.1116/1.5003271.
Kim, Woo-Hee, Sung, Dougyong, Oh, Sejin, Woo, Jehun, Lim, Seungkyu, Lee, Hyunju, & Bent, Stacey F. Thermal adsorption-enhanced atomic layer etching of Si 3 N 4. United States. doi:10.1116/1.5003271.
Kim, Woo-Hee, Sung, Dougyong, Oh, Sejin, Woo, Jehun, Lim, Seungkyu, Lee, Hyunju, and Bent, Stacey F. Mon . "Thermal adsorption-enhanced atomic layer etching of Si 3 N 4". United States. doi:10.1116/1.5003271.
@article{osti_1541660,
title = {Thermal adsorption-enhanced atomic layer etching of Si 3 N 4},
author = {Kim, Woo-Hee and Sung, Dougyong and Oh, Sejin and Woo, Jehun and Lim, Seungkyu and Lee, Hyunju and Bent, Stacey F.},
abstractNote = {Not provided.},
doi = {10.1116/1.5003271},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
issn = {0734-2101},
number = 1,
volume = 36,
place = {United States},
year = {2018},
month = {1}
}