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Title: Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition

Abstract

Not provided.

Authors:
 [1];  [2]; ORCiD logo [3];  [3];  [4];  [3]; ORCiD logo [1]
  1. Peter A. Rock Thermochemistry Laboratory and NEAT ORU University of California Davis Davis California
  2. Peter A. Rock Thermochemistry Laboratory and NEAT ORU University of California Davis Davis California; State Key Laboratory for Mechanical Behavior of Materials Xi'an Jiaotong University Xi'an China
  3. Department of Chemistry and Biochemistry Brigham Young University Provo Utah
  4. Logic Technology Development Intel Corporation Hillsboro Oregon
Publication Date:
Research Org.:
Brigham Young Univ., Provo, UT (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1541599
DOE Contract Number:  
SC0016446
Resource Type:
Journal Article
Journal Name:
Journal of the American Ceramic Society
Additional Journal Information:
Journal Volume: 101; Journal Issue: 5; Journal ID: ISSN 0002-7820
Publisher:
American Ceramic Society
Country of Publication:
United States
Language:
English
Subject:
Materials Science

Citation Formats

Chen, Jiewei, Niu, Min, Calvin, Jason, Asplund, Megan, King, Sean W., Woodfield, Brian F., and Navrotsky, Alexandra. Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition. United States: N. p., 2017. Web. doi:10.1111/jace.15350.
Chen, Jiewei, Niu, Min, Calvin, Jason, Asplund, Megan, King, Sean W., Woodfield, Brian F., & Navrotsky, Alexandra. Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition. United States. doi:10.1111/jace.15350.
Chen, Jiewei, Niu, Min, Calvin, Jason, Asplund, Megan, King, Sean W., Woodfield, Brian F., and Navrotsky, Alexandra. Fri . "Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition". United States. doi:10.1111/jace.15350.
@article{osti_1541599,
title = {Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition},
author = {Chen, Jiewei and Niu, Min and Calvin, Jason and Asplund, Megan and King, Sean W. and Woodfield, Brian F. and Navrotsky, Alexandra},
abstractNote = {Not provided.},
doi = {10.1111/jace.15350},
journal = {Journal of the American Ceramic Society},
issn = {0002-7820},
number = 5,
volume = 101,
place = {United States},
year = {2017},
month = {12}
}

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