Skip to main content
OSTI.GOVU.S. Department of Energy Office of Scientific and Technical Information
U.S. Department of Energy
Office of Scientific and Technical Information
 

Thermodynamics of amorphous SiN(O)H dielectric films synthesized by plasma-enhanced chemical vapor deposition

Journal Article · · Journal of the American Ceramic Society
DOI:https://doi.org/10.1111/jace.15350· OSTI ID:1541599
 [1];  [2];  [3];  [3];  [4];  [3];  [1]
  1. Peter A. Rock Thermochemistry Laboratory and NEAT ORU University of California Davis Davis California
  2. Peter A. Rock Thermochemistry Laboratory and NEAT ORU University of California Davis Davis California; State Key Laboratory for Mechanical Behavior of Materials Xi'an Jiaotong University Xi'an China
  3. Department of Chemistry and Biochemistry Brigham Young University Provo Utah
  4. Logic Technology Development Intel Corporation Hillsboro Oregon
+ Show Author Affiliations

Not provided.

Research Organization:
Brigham Young Univ., Provo, UT (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
DOE Contract Number:
SC0016446
OSTI ID:
1541599
Journal Information:
Journal of the American Ceramic Society, Vol. 101, Issue 5; ISSN 0002-7820
Publisher:
American Ceramic Society
Country of Publication:
United States
Language:
English

References (64)

Lattice vacancies responsible for the linear dependence of the low-temperature heat capacity of insulating materials January 2015
Heat capacity of copper on the ITS-90 temperature scale using adiabatic calorimetry October 2004
X-ray photoelectron spectroscopy measurement of the Schottky barrier at the SiC(N)/Cu interface
  • No authors listed
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena https://doi.org/10.1116/1.3633691
September 2011
Secondary phase inclusions in polycrystalline sheet silicon September 2004
Critical phenomena at the antiferromagnetic transition in MnO September 1999
Hydrogen bonding configurations in silicon nitride films prepared by plasma‐enhanced deposition July 1985
Intrinsic stress effect on fracture toughness of plasma enhanced chemical vapor deposited SiNx:H films June 2010
Growth and surface structure analysis of a new SiON single layer on SiC(0001) October 2014
An improved technique for accurate heat capacity measurements on powdered samples using a commercial relaxation calorimeter August 2011
Evidence for the formation of SiON glasses April 1998
Thermal dissociation process of hydrogen atoms in plasma-enhanced chemical vapor deposited silicon nitride films November 1998
Nuclear reaction analysis for H, Li, Be, B, C, N, O and F with an RBS check March 2016
Oxynitride Glasses August 1986
Plasma‐enhanced growth and composition of silicon oxynitride films October 1986
Thermal Expansion and Atomic Structure of Amorphous Silicon Nitride Thin Films October 2003
Enhanced Interfacial Adhesion and Osteogenesis for Rapid “Bone-like” Biomineralization by PECVD-Based Silicon Oxynitride Overlays July 2015
In-Situ Reactive Synthesis of Si2N2O Ceramics and Its Properties August 2012
Specific Heats at Low Temperatures January 1966
Discussion on device structures and hermetic encapsulation for SiO x random access memory operation in air October 2014
Thermally induced damages of PECVD SiN x thin films August 2011
Solubility of Si3N4 in Liquid SiO2 January 2002
Silicon oxynitride films deposited by reactive high power impulse magnetron sputtering using nitrous oxide as a single-source precursor September 2015
Thermodynamic Stability of Low- k Amorphous SiOCH Dielectric Films April 2016
Properties of Plasma-Deposited Silicon Nitride January 1979
Network structure of a-SiO:H layers fabricated by plasma-enhanced chemical vapor deposition: Comparison with a-SiC:H layers May 2016
Effect of gas composition on Si2N2O formation in the Si-C-N-O system May 1991
Progress and new directions in high temperature calorimetry revisited April 1997
Mechanical and thermophysical properties of PECVD oxynitride films measured by MEMS November 2001
A method to extract absorption coefficient of thin films from transmission spectra of the films on thick substrates April 2012
The Variation of Physical Properties of Plasma-Deposited Silicon Nitride and Oxynitride with Their Compositions January 1984
Synthesis and characterization of silicon nitride whiskers March 1990
Tunable Plasticity in Amorphous Silicon Carbide Films July 2013
Characterization of Silicon-Oxynitride Films Deposited by Plasma-Enhanced CVD January 1986
Improved resistive switching phenomena observed in SiN x -based resistive switching memory through oxygen doping process : Improved resistive switching phenomena observed in SiN December 2013
Oxynitride glasses prepared from gels and melts July 1983
Intrinsic stress fracture energy measurements for PECVD thin films in the SiOxCyNz:H system July 2009
Oxynitride glasses and glass-ceramics May 1980
Oxidation of silicon nitride prepared by plasma‐enhanced chemical vapor deposition at low temperature October 1994
N-doped polymer-derived Si(N)OC: The role of the N-containing precursor February 2015
Plasma‐enhanced growth, composition, and refractive index of silicon oxy‐nitride films June 1995
Gas barrier properties of SiON films deposited by plasma enhanced chemical vapor deposition at low temperature as a function of the plasma process parameters August 2013
Stability of hydrogen in silicon nitride films deposited by low-pressure and plasma enhanced chemical vapor deposition techniques March 1989
Sinoite (Si 2 N 2 O); crystallization from EL chondrite impact melts October 1997
Preparation of quaternary nitrogen-containing plasma films and their application to moisture sensors August 1984
Formation of Si 2 N 2 O Microcrystalline Precipitates near the Quartz Crucible Wall Coated with Silicon Nitride in Cast-Grown Silicon August 2013
Progress and new directions in high temperature calorimetry January 1977
Optomechanical characterisation of compressively prestressed silicon oxynitride films deposited by plasma-enhanced chemical vapour deposition on silicon membranes December 2004
Visible light emission from thin films containing Si, O, N, and H September 1995
Analysis of Low-k Dielectric Thin Films on Thick Substrates by Transmission FTIR Spectroscopy October 2014
Progress and New Directions in Calorimetry: A 2014 Perspective October 2014
Dielectric Barrier, Etch Stop, and Metal Capping Materials for State of the Art and beyond Metal Interconnects October 2014
Massive stress changes in plasma-enhanced chemical vapor deposited silicon nitride films on thermal cycling July 2004
Minimization of dangling bond defects in hydrogenated silicon nitride dielectrics for thin film transistors (TFTs) May 1998
Analysis of sub-stoichiometric hydrogenated silicon oxide films for surface passivation of crystalline silicon solar cells September 2012
Numerical analysis of the formation of Si3N4 and Si2N2O during a directional solidification process in multicrystalline silicon for solar cells April 2009
Fourier transform infrared spectroscopy investigation of chemical bonding in low-k a-SiC:H thin films July 2011
Free energy model for the analysis of bonding in a ‐Si x N y H z alloys May 1991
In situ study of amorphization and changes in coordination in Si 2 N 2 O at high pressure April 2008
Fabrication of UV-transparent SixOyNz membranes with a low frequency PECVD reactor April 2002
Comparative investigation of hydrogen bonding in silicon based PECVD grown dielectrics for optical waveguides June 2004
Study of the mechanical and structural properties of silicon oxynitride films for optical applications July 2006
Hydrogen incorporation in silicon (oxy)nitride thin films November 1988
The high‐pressure behavior of α‐quartz, oxynitride, and nitride structures January 1981
Properties of Si[sub x]O[sub y]N[sub z] Films on Si January 1968

Similar Records

Related Subjects

Materials Science