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Title: Fundamentally fastest optical processes at the surface of a topological insulator

Abstract

Not provided.

Authors:
; ; ;
Publication Date:
Research Org.:
Georgia State Univ., Atlanta, GA (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1540986
DOE Contract Number:  
FG02-01ER15213; SC0007043
Resource Type:
Journal Article
Journal Name:
Physical Review B
Additional Journal Information:
Journal Volume: 98; Journal Issue: 12; Journal ID: ISSN 2469-9950
Publisher:
American Physical Society (APS)
Country of Publication:
United States
Language:
English
Subject:
Materials Science; Physics

Citation Formats

Oliaei Motlagh, S. Azar, Wu, Jhih-Sheng, Apalkov, Vadym, and Stockman, Mark I. Fundamentally fastest optical processes at the surface of a topological insulator. United States: N. p., 2018. Web. doi:10.1103/physrevb.98.125410.
Oliaei Motlagh, S. Azar, Wu, Jhih-Sheng, Apalkov, Vadym, & Stockman, Mark I. Fundamentally fastest optical processes at the surface of a topological insulator. United States. doi:10.1103/physrevb.98.125410.
Oliaei Motlagh, S. Azar, Wu, Jhih-Sheng, Apalkov, Vadym, and Stockman, Mark I. Sat . "Fundamentally fastest optical processes at the surface of a topological insulator". United States. doi:10.1103/physrevb.98.125410.
@article{osti_1540986,
title = {Fundamentally fastest optical processes at the surface of a topological insulator},
author = {Oliaei Motlagh, S. Azar and Wu, Jhih-Sheng and Apalkov, Vadym and Stockman, Mark I.},
abstractNote = {Not provided.},
doi = {10.1103/physrevb.98.125410},
journal = {Physical Review B},
issn = {2469-9950},
number = 12,
volume = 98,
place = {United States},
year = {2018},
month = {9}
}

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