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Title: Sub-monolayer control of the growth of oxide films on mesoporous materials

Abstract

Mixed oxide surfaces were developedviathe atomic layer deposition of a variety of oxide thin films on mesoporous materials.

Authors:
 [1];  [1];  [1]; ORCiD logo [1]
  1. Department of Chemistry and UCR Center for Catalysis; University of California; Riverside; USA
Publication Date:
Research Org.:
Univ. of California, Riverside, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1540097
DOE Contract Number:  
SC0001839
Resource Type:
Journal Article
Journal Name:
Journal of Materials Chemistry. A
Additional Journal Information:
Journal Volume: 6; Journal Issue: 36; Journal ID: ISSN 2050-7488
Publisher:
Royal Society of Chemistry
Country of Publication:
United States
Language:
English
Subject:
Chemistry; Energy & Fuels; Materials Science

Citation Formats

Weng, Zhihuan, Chen, Zhi-hui, Qin, Xiangdong, and Zaera, Francisco. Sub-monolayer control of the growth of oxide films on mesoporous materials. United States: N. p., 2018. Web. doi:10.1039/c8ta05431b.
Weng, Zhihuan, Chen, Zhi-hui, Qin, Xiangdong, & Zaera, Francisco. Sub-monolayer control of the growth of oxide films on mesoporous materials. United States. doi:10.1039/c8ta05431b.
Weng, Zhihuan, Chen, Zhi-hui, Qin, Xiangdong, and Zaera, Francisco. Mon . "Sub-monolayer control of the growth of oxide films on mesoporous materials". United States. doi:10.1039/c8ta05431b.
@article{osti_1540097,
title = {Sub-monolayer control of the growth of oxide films on mesoporous materials},
author = {Weng, Zhihuan and Chen, Zhi-hui and Qin, Xiangdong and Zaera, Francisco},
abstractNote = {Mixed oxide surfaces were developedviathe atomic layer deposition of a variety of oxide thin films on mesoporous materials.},
doi = {10.1039/c8ta05431b},
journal = {Journal of Materials Chemistry. A},
issn = {2050-7488},
number = 36,
volume = 6,
place = {United States},
year = {2018},
month = {1}
}

Works referenced in this record:

Atomic Layer Deposition: An Overview
journal, January 2010

  • George, Steven M.
  • Chemical Reviews, Vol. 110, Issue 1, p. 111-131
  • DOI: 10.1021/cr900056b

Mechanisms of surface reactions in thin solid film chemical deposition processes
journal, December 2013


Atomic Layer Deposition of Noble Metals and Their Oxides
journal, September 2013

  • Hämäläinen, Jani; Ritala, Mikko; Leskelä, Markku
  • Chemistry of Materials, Vol. 26, Issue 1
  • DOI: 10.1021/cm402221y

Atomic layer deposition—Sequential self-limiting surface reactions for advanced catalyst “bottom-up” synthesis
journal, June 2016


Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing
journal, January 2003

  • Kim, H.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 21, Issue 6
  • DOI: 10.1116/1.1622676

AVD and ALD as Two Complementary Technology Solutions for Next Generation Dielectric and Conductive Thin-Film Processing
journal, March 2006

  • Schumacher, M.; Baumann, P. K.; Seidel, T.
  • Chemical Vapor Deposition, Vol. 12, Issue 2-3
  • DOI: 10.1002/cvde.200500027

Atomic Layer Deposition of High- k Oxides of the Group 4 Metals for Memory Applications
journal, April 2009

  • Niinistö, Jaakko; Kukli, Kaupo; Heikkilä, Mikko
  • Advanced Engineering Materials, Vol. 11, Issue 4
  • DOI: 10.1002/adem.200800316

Applications of atomic layer deposition to nanofabrication and emerging nanodevices
journal, February 2009

  • Kim, Hyungjun; Lee, Han-Bo-Ram; Maeng, W.-J.
  • Thin Solid Films, Vol. 517, Issue 8, p. 2563-2580
  • DOI: 10.1016/j.tsf.2008.09.007

Emerging Applications of Atomic Layer Deposition for Lithium-Ion Battery Studies
journal, June 2012

  • Meng, Xiangbo; Yang, Xiao-Qing; Sun, Xueliang
  • Advanced Materials, Vol. 24, Issue 27
  • DOI: 10.1002/adma.201200397

Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing
journal, June 2012

  • van Delft, J. A.; Garcia-Alonso, D.; Kessels, W. M. M.
  • Semiconductor Science and Technology, Vol. 27, Issue 7
  • DOI: 10.1088/0268-1242/27/7/074002

A brief review of atomic layer deposition: from fundamentals to applications
journal, June 2014


Nanoscale Structuring of Surfaces by Using Atomic Layer Deposition
journal, November 2015

  • Sobel, Nicolas; Hess, Christian
  • Angewandte Chemie International Edition, Vol. 54, Issue 50
  • DOI: 10.1002/anie.201503680

Atomic layer deposition for nanomaterial synthesis and functionalization in energy technology
journal, January 2017

  • Meng, Xiangbo; Wang, Xinwei; Geng, Dongsheng
  • Materials Horizons, Vol. 4, Issue 2
  • DOI: 10.1039/C6MH00521G

Spatial atomic layer deposition on flexible porous substrates: ZnO on anodic aluminum oxide films and Al2O3 on Li ion battery electrodes
journal, December 2015

  • Sharma, Kashish; Routkevitch, Dmitri; Varaksa, Natalia
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 34, Issue 1
  • DOI: 10.1116/1.4937728

A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches
journal, March 2003

  • Gordon, R. G.; Hausmann, D.; Kim, E.
  • Chemical Vapor Deposition, Vol. 9, Issue 2, p. 73-78
  • DOI: 10.1002/cvde.200390005

Conformal Coating on Ultrahigh-Aspect-Ratio Nanopores of Anodic Alumina by Atomic Layer Deposition
journal, September 2003

  • Elam, J. W.; Routkevitch, D.; Mardilovich, P. P.
  • Chemistry of Materials, Vol. 15, Issue 18, p. 3507-3517
  • DOI: 10.1021/cm0303080

Modeling the Conformality of Atomic Layer Deposition: The Effect of Sticking Probability
journal, January 2009

  • Dendooven, J.; Deduytsche, D.; Musschoot, J.
  • Journal of The Electrochemical Society, Vol. 156, Issue 4, p. P63-P67
  • DOI: 10.1149/1.3072694

Method to determine the sticking coefficient of precursor molecules in atomic layer deposition
journal, April 2009


Modeling precursor diffusion and reaction of atomic layer deposition in porous structures
journal, January 2015

  • Keuter, Thomas; Menzler, Norbert Heribert; Mauer, Georg
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 33, Issue 1, Article No. 01A104
  • DOI: 10.1116/1.4892385

Transient ALD simulations for a multi-wafer reactor with trenched wafers
journal, September 2007


Atomic layer deposition of TiO2 on mesoporous silica
journal, September 2006


Tailoring nanoporous materials by atomic layer deposition
journal, January 2011

  • Detavernier, Christophe; Dendooven, Jolien; Pulinthanathu Sree, Sreeprasanth
  • Chemical Society Reviews, Vol. 40, Issue 11
  • DOI: 10.1039/c1cs15091j

Atomic Layer Deposition-Modified Ordered Mesoporous Silica Membranes
journal, March 2012

  • Cassidy, David E.; DeSisto, William J.
  • Chemical Vapor Deposition, Vol. 18, Issue 1-3
  • DOI: 10.1002/cvde.201106931

Pore radius fine tuning of a silica matrix (MCM-41) based on the synthesis of alumina nanolayers with different thicknesses by atomic layer deposition
journal, March 2015

  • Zemtsova, Elena G.; Arbenin, Andrei Yu.; Plotnikov, Alexander F.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 33, Issue 2
  • DOI: 10.1116/1.4907989

Atomic Layer Deposition of TiO 2 on Graphene for Supercapacitors
journal, January 2012

  • Sun, Xiang; Xie, Ming; Wang, Gongkai
  • Journal of The Electrochemical Society, Vol. 159, Issue 4
  • DOI: 10.1149/2.025204jes

Synthesis of ZnO quantum dot/graphene nanocomposites by atomic layer deposition with high lithium storage capacity
journal, January 2014

  • Sun, Xiang; Zhou, Changgong; Xie, Ming
  • J. Mater. Chem. A, Vol. 2, Issue 20
  • DOI: 10.1039/C4TA00589A

Nanostructured materials for applications in heterogeneous catalysis
journal, January 2013


Synthesis and Stabilization of Supported Metal Catalysts by Atomic Layer Deposition
journal, March 2013

  • Lu, Junling; Elam, Jeffrey W.; Stair, Peter C.
  • Accounts of Chemical Research, Vol. 46, Issue 8
  • DOI: 10.1021/ar300229c

Stabilization of Copper Catalysts for Liquid-Phase Reactions by Atomic Layer Deposition
journal, November 2013

  • O'Neill, Brandon J.; Jackson, David H. K.; Crisci, Anthony J.
  • Angewandte Chemie International Edition, Vol. 52, Issue 51
  • DOI: 10.1002/anie.201308245

Shape-Controlled Nanostructures in Heterogeneous Catalysis
journal, September 2013


Nanoengineering Heterogeneous Catalysts by Atomic Layer Deposition
journal, June 2017


Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
journal, June 2005

  • Puurunen, Riikka L.
  • Journal of Applied Physics, Vol. 97, Issue 12, Article No. 121301
  • DOI: 10.1063/1.1940727

Quartz Crystal Microbalance Studies of Al 2 O 3 Atomic Layer Deposition Using Trimethylaluminum and Water at 125 °C
journal, January 2010

  • Wind, R. A.; George, S. M.
  • The Journal of Physical Chemistry A, Vol. 114, Issue 3
  • DOI: 10.1021/jp9049268

Aluminium atomic layer deposition applied to mesoporous zeolites for acid catalytic activity enhancement
journal, January 2011

  • Sree, Sreeprasanth Pulinthanathu; Dendooven, Jolien; Korányi, Tamás I.
  • Catalysis Science & Technology, Vol. 1, Issue 2
  • DOI: 10.1039/c0cy00056f

Alumina Over-coating on Pd Nanoparticle Catalysts by Atomic Layer Deposition: Enhanced Stability and Reactivity
journal, January 2011


Characteristics of TiOx films prepared by chemical vapor deposition using tetrakis-dimethyl-amido-titanium and water
journal, March 2006


Atomic layer deposition of TiO2 from tetrakis-dimethyl-amido titanium or Ti isopropoxide precursors and H2O
journal, October 2007

  • Xie, Qi; Jiang, Yu-Long; Detavernier, Christophe
  • Journal of Applied Physics, Vol. 102, Issue 8
  • DOI: 10.1063/1.2798384

Atomic layer deposition of TiO 2 from tetrakis(dimethylamino)titanium and H 2 O
journal, October 2013


Wafer-scale fabrication of conformal atomic-layered TiO2 by atomic layer deposition using tetrakis (dimethylamino) titanium and H2O precursors
journal, April 2017


Advances in deposition processes for passivation films
journal, September 1977

  • Kern, Werner; Rosler, Richard S.
  • Journal of Vacuum Science and Technology, Vol. 14, Issue 5
  • DOI: 10.1116/1.569340

Low-temperature synthesis of nanoscale silica multilayers – atomic layer deposition in a test tube
journal, January 2010

  • Hatton, Benjamin; Kitaev, Vladimir; Perovic, Doug
  • Journal of Materials Chemistry, Vol. 20, Issue 29
  • DOI: 10.1039/c0jm00696c

Atomic layer deposition of SiO2 at room temperature using NH3-catalyzed sequential surface reactions
journal, February 2000


ALD of SiO[sub 2] at Room Temperature Using TEOS and H[sub 2]O with NH[sub 3] as the Catalyst
journal, January 2004

  • Ferguson, J. D.; Smith, E. R.; Weimer, A. W.
  • Journal of The Electrochemical Society, Vol. 151, Issue 8
  • DOI: 10.1149/1.1768548

The Determination of Pore Volume and Area Distributions in Porous Substances. I. Computations from Nitrogen Isotherms
journal, January 1951

  • Barrett, Elliott P.; Joyner, Leslie G.; Halenda, Paul P.
  • Journal of the American Chemical Society, Vol. 73, Issue 1
  • DOI: 10.1021/ja01145a126

Adsorption of Gases in Multimolecular Layers
journal, February 1938

  • Brunauer, Stephen; Emmett, P. H.; Teller, Edward
  • Journal of the American Chemical Society, Vol. 60, Issue 2, p. 309-319
  • DOI: 10.1021/ja01269a023

Low-Temperature Al2O3 Atomic Layer Deposition
journal, February 2004

  • Groner, M. D.; Fabreguette, F. H.; Elam, J. W.
  • Chemistry of Materials, Vol. 16, Issue 4, p. 639-645
  • DOI: 10.1021/cm0304546

Atomic Layer Deposition of Aluminum Oxide in Mesoporous Silica Gel
journal, September 2010

  • Elam, Jeffrey W.; Libera, Joseph A.; Huynh, Trang H.
  • The Journal of Physical Chemistry C, Vol. 114, Issue 41
  • DOI: 10.1021/jp1030587

Stepwise Pore Size Reduction of Ordered Nanoporous Silica Materials at Angstrom Precision
journal, May 2013

  • Jambhrunkar, Siddharth; Yu, Meihua; Yang, Jie
  • Journal of the American Chemical Society, Vol. 135, Issue 23
  • DOI: 10.1021/ja402463h

Surface structuring of mesoporous materials by controlled synthesis of nanocavities
journal, November 2016


Highly efficient CoO x /SBA-15 catalysts prepared by atomic layer deposition for the epoxidation reaction of styrene
journal, January 2017

  • Li, Yunqin; Zhao, Shichao; Hu, Qingmin
  • Catalysis Science & Technology, Vol. 7, Issue 10
  • DOI: 10.1039/C7CY00349H

A new family of mesoporous molecular sieves prepared with liquid crystal templates
journal, December 1992

  • Beck, J. S.; Vartuli, J. C.; Roth, W. J.
  • Journal of the American Chemical Society, Vol. 114, Issue 27, p. 10834-10843
  • DOI: 10.1021/ja00053a020

Cubic Mesoporous Silica with Large Controllable Entrance Sizes and Advanced Adsorption Properties
journal, July 2003

  • Fan, Jie; Yu, Chengzhong; Gao, Feng
  • Angewandte Chemie International Edition, Vol. 42, Issue 27
  • DOI: 10.1002/anie.200351027