Gas-Phase Electron-Impact Activation of Atomic Layer Deposition (ALD) Precursors: MeCpPtMe ₃

Journal Article · Wed Aug 01 00:00:00 EDT 2018 · Journal of Physical Chemistry Letters

DOI:https://doi.org/10.1021/acs.jpclett.8b02125· OSTI ID:1539341

Lien, Clinton ^[1]; Konh, Mahsa ^[2]; Chen, Bo ^[1]; Teplyakov, Andrew V.  ^[2]; Zaera, Francisco  ^[1]

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1. Department of Chemistry, University of California, Riverside, California 02521, United States
2. Department of Chemistry and Biochemistry, University of Delaware, Newark, Delaware 19716, United States

Not provided.

• Research Organization: Univ. of California, Riverside, CA (United States)
• Sponsoring Organization: USDOE Office of Science (SC)
• DOE Contract Number: SC0001839
• OSTI ID: 1539341
• Journal Information: Journal of Physical Chemistry Letters, Vol. 9, Issue 16; ISSN 1948-7185
• Publisher: American Chemical Society
• Country of Publication: United States
• Language: English

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