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Title: Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching

Abstract

Not provided.

Authors:
; ; ; ; ;
Publication Date:
Research Org.:
Univ. of Illinois at Urbana-Champaign, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1537776
DOE Contract Number:  
FG02-07ER46453; FG02-07ER46471
Resource Type:
Journal Article
Journal Name:
Plasma Chemistry and Plasma Processing
Additional Journal Information:
Journal Volume: 38; Journal Issue: 1; Journal ID: ISSN 0272-4324
Publisher:
Springer
Country of Publication:
United States
Language:
English
Subject:
Engineering; Physics

Citation Formats

Elg, Daniel T., Panici, Gianluca A., Liu, Sumeng, Girolami, Gregory, Srivastava, Shailendra N., and Ruzic, David N. Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching. United States: N. p., 2017. Web. doi:10.1007/s11090-017-9852-4.
Elg, Daniel T., Panici, Gianluca A., Liu, Sumeng, Girolami, Gregory, Srivastava, Shailendra N., & Ruzic, David N. Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching. United States. doi:10.1007/s11090-017-9852-4.
Elg, Daniel T., Panici, Gianluca A., Liu, Sumeng, Girolami, Gregory, Srivastava, Shailendra N., and Ruzic, David N. Tue . "Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching". United States. doi:10.1007/s11090-017-9852-4.
@article{osti_1537776,
title = {Removal of Tin from Extreme Ultraviolet Collector Optics by In-Situ Hydrogen Plasma Etching},
author = {Elg, Daniel T. and Panici, Gianluca A. and Liu, Sumeng and Girolami, Gregory and Srivastava, Shailendra N. and Ruzic, David N.},
abstractNote = {Not provided.},
doi = {10.1007/s11090-017-9852-4},
journal = {Plasma Chemistry and Plasma Processing},
issn = {0272-4324},
number = 1,
volume = 38,
place = {United States},
year = {2017},
month = {10}
}

Works referenced in this record:

Cramming More Components Onto Integrated Circuits
journal, January 1998


Laser wavelength effects on the charge state resolved ion energy distributions from laser-produced Sn plasma
journal, February 2010

  • Burdt, Russell A.; Tao, Yezheng; Tillack, Mark S.
  • Journal of Applied Physics, Vol. 107, Issue 4
  • DOI: 10.1063/1.3309413

Sn etching with hydrogen radicals to clean EUV optics
journal, January 2010


Generation and decomposition of volatile tin hydrides monitored by in situ quartz crystal microbalances
journal, November 2012


Decomposition of SnH4 molecules on metal and metal–oxide surfaces
journal, January 2014


Removal of amorphous C and Sn on Mo:Si multilayer mirror surface in Hydrogen plasma and afterglow
journal, May 2012

  • Braginsky, O. V.; Kovalev, A. S.; Lopaev, D. V.
  • Journal of Applied Physics, Vol. 111, Issue 9
  • DOI: 10.1063/1.4709408

In situ collector cleaning and extreme ultraviolet reflectivity restoration by hydrogen plasma for extreme ultraviolet sources
journal, March 2016

  • Elg, Daniel T.; Sporre, John R.; Panici, Gianluca A.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 34, Issue 2
  • DOI: 10.1116/1.4942456

Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source
journal, April 2017

  • Elg, Daniel T.; Panici, Gianluca A.; Peck, Jason A.
  • Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 16, Issue 2
  • DOI: 10.1117/1.JMM.16.2.023501

Determination of density of hydrogen atoms in the ground state
journal, June 1996


An Iron Catalytic Probe for Determination of the O-atom Density in an Ar/O2 Afterglow
journal, April 2006

  • Mozetic, M.; Vesel, A.; Cvelbar, U.
  • Plasma Chemistry and Plasma Processing, Vol. 26, Issue 2
  • DOI: 10.1007/s11090-006-9004-8

Catalytic probes for measuring H distribution in remote parts of hydrogen plasma reactors
journal, June 2007


The Thermal Decomposition of Tin Hydride.
journal, May 1956


The Preparation and Some Properties of Hydrides of Elements of the Fourth Group of the Periodic System and of their Organic Derivatives
journal, November 1947

  • Finholt, A. E.; Bond, A. C.; Wilzbach, K. E.
  • Journal of the American Chemical Society, Vol. 69, Issue 11
  • DOI: 10.1021/ja01203a041

Über die Reindarstellung und Eigenschaften des Zinnwasserstoffs
journal, November 1924

  • Paneth, Fritz; Haken, Wilhelm; Rabinowitsch, Eugen
  • Berichte der deutschen chemischen Gesellschaft (A and B Series), Vol. 57, Issue 10
  • DOI: 10.1002/cber.19240571022

Oxidation study of pure tin and its alloys via electrochemical reduction analysis
journal, May 2005


Hydrogen mediated transport of Sn to Ru film surface
journal, March 2009

  • Faradzhev, Nadir; Sidorkin, Vadim
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 27, Issue 2
  • DOI: 10.1116/1.3081968

The reduction of oxide films by atomic hydrogen
journal, May 1957


Downstream plasma transport and metal ionization in a high-powered pulsed-plasma magnetron
journal, June 2014

  • Meng, Liang; Yu, He; Szott, Matthew M.
  • Journal of Applied Physics, Vol. 115, Issue 22
  • DOI: 10.1063/1.4878622

Micro/Nano-pore Network Analysis of Gas Flow in Shale Matrix
journal, August 2015

  • Zhang, Pengwei; Hu, Liming; Meegoda, Jay N.
  • Scientific Reports, Vol. 5, Issue 1
  • DOI: 10.1038/srep13501

A mathematical model for a plasma‐assisted downstream etching reactor
journal, October 1989

  • Park, Sang‐Kyu; Economou, Demetre J.
  • Journal of Applied Physics, Vol. 66, Issue 7
  • DOI: 10.1063/1.344118

Numerical Simulation of a Single-Wafer Isothermal Plasma Etching Reactor
journal, January 1990

  • Park, Sang-Kyu
  • Journal of The Electrochemical Society, Vol. 137, Issue 8
  • DOI: 10.1149/1.2086999