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Title: Interfacial Effects of Tin Oxide Atomic Layer Deposition in Metal Halide Perovskite Photovoltaics

Abstract

Not provided.

Authors:
ORCiD logo [1];  [1];  [2];  [2];  [3];  [2];  [2];  [1];  [2];  [2];  [3];  [2];  [1]
  1. Department of Chemical Engineering, Stanford University, Stanford CA 94305 USA
  2. Department of Materials Science and Engineering, Stanford University, Stanford CA 94305 USA
  3. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge MA 02142 USA
Publication Date:
Research Org.:
Stanford Univ., CA (United States)
Sponsoring Org.:
USDOE Office of Energy Efficiency and Renewable Energy (EERE)
OSTI Identifier:
1537423
DOE Contract Number:  
EE0008154
Resource Type:
Journal Article
Journal Name:
Advanced Energy Materials
Additional Journal Information:
Journal Volume: 8; Journal Issue: 23; Journal ID: ISSN 1614-6832
Publisher:
Wiley
Country of Publication:
United States
Language:
English
Subject:
Chemistry; Energy & Fuels; Materials Science; Physics

Citation Formats

Palmstrom, Axel F., Raiford, James A., Prasanna, Rohit, Bush, Kevin A., Sponseller, Melany, Cheacharoen, Rongrong, Minichetti, Maxmillian C., Bergsman, David S., Leijtens, Tomas, Wang, Hsin-Ping, Bulović, Vladimir, McGehee, Michael D., and Bent, Stacey F. Interfacial Effects of Tin Oxide Atomic Layer Deposition in Metal Halide Perovskite Photovoltaics. United States: N. p., 2018. Web. doi:10.1002/aenm.201800591.
Palmstrom, Axel F., Raiford, James A., Prasanna, Rohit, Bush, Kevin A., Sponseller, Melany, Cheacharoen, Rongrong, Minichetti, Maxmillian C., Bergsman, David S., Leijtens, Tomas, Wang, Hsin-Ping, Bulović, Vladimir, McGehee, Michael D., & Bent, Stacey F. Interfacial Effects of Tin Oxide Atomic Layer Deposition in Metal Halide Perovskite Photovoltaics. United States. doi:10.1002/aenm.201800591.
Palmstrom, Axel F., Raiford, James A., Prasanna, Rohit, Bush, Kevin A., Sponseller, Melany, Cheacharoen, Rongrong, Minichetti, Maxmillian C., Bergsman, David S., Leijtens, Tomas, Wang, Hsin-Ping, Bulović, Vladimir, McGehee, Michael D., and Bent, Stacey F. Mon . "Interfacial Effects of Tin Oxide Atomic Layer Deposition in Metal Halide Perovskite Photovoltaics". United States. doi:10.1002/aenm.201800591.
@article{osti_1537423,
title = {Interfacial Effects of Tin Oxide Atomic Layer Deposition in Metal Halide Perovskite Photovoltaics},
author = {Palmstrom, Axel F. and Raiford, James A. and Prasanna, Rohit and Bush, Kevin A. and Sponseller, Melany and Cheacharoen, Rongrong and Minichetti, Maxmillian C. and Bergsman, David S. and Leijtens, Tomas and Wang, Hsin-Ping and Bulović, Vladimir and McGehee, Michael D. and Bent, Stacey F.},
abstractNote = {Not provided.},
doi = {10.1002/aenm.201800591},
journal = {Advanced Energy Materials},
issn = {1614-6832},
number = 23,
volume = 8,
place = {United States},
year = {2018},
month = {6}
}

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