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Title: Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source

Abstract

Not provided.

Authors:
 [1];  [1];  [1];  [2];  [1]
  1. University of Illinois at Urbana-Champaign, Center for Plasma-Material Interactions, Department of Nuclear, Plasma, and Radiological Engineering, Urbana, Illinois, United States
  2. University of Illinois at Urbana-Champaign, Applied Research Institute, Champaign, Illinois, United States
Publication Date:
Research Org.:
Univ. of Illinois at Urbana-Champaign, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1536824
DOE Contract Number:  
FG02-07ER46453; FG02-07ER46471
Resource Type:
Journal Article
Journal Name:
Journal of Micro/Nanolithography, MEMS, and MOEMS
Additional Journal Information:
Journal Volume: 16; Journal Issue: 2; Journal ID: ISSN 1932-5150
Publisher:
SPIE
Country of Publication:
United States
Language:
English
Subject:
Engineering; Science & Technology - Other Topics; Materials Science; Optics

Citation Formats

Elg, Daniel T., Panici, Gianluca A., Peck, Jason A., Srivastava, Shailendra N., and Ruzic, David N. Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source. United States: N. p., 2017. Web. doi:10.1117/1.jmm.16.2.023501.
Elg, Daniel T., Panici, Gianluca A., Peck, Jason A., Srivastava, Shailendra N., & Ruzic, David N. Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source. United States. doi:10.1117/1.jmm.16.2.023501.
Elg, Daniel T., Panici, Gianluca A., Peck, Jason A., Srivastava, Shailendra N., and Ruzic, David N. Sat . "Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source". United States. doi:10.1117/1.jmm.16.2.023501.
@article{osti_1536824,
title = {Modeling and measurement of hydrogen radical densities of in situ plasma-based Sn cleaning source},
author = {Elg, Daniel T. and Panici, Gianluca A. and Peck, Jason A. and Srivastava, Shailendra N. and Ruzic, David N.},
abstractNote = {Not provided.},
doi = {10.1117/1.jmm.16.2.023501},
journal = {Journal of Micro/Nanolithography, MEMS, and MOEMS},
issn = {1932-5150},
number = 2,
volume = 16,
place = {United States},
year = {2017},
month = {4}
}

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