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Title: Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films

Abstract

Not provided.

Authors:
; ; ; ; ; ;
Publication Date:
Research Org.:
The Ohio State Univ., Columbus, OH (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1536470
DOE Contract Number:  
SC0001304
Resource Type:
Journal Article
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Volume: 118; Journal Issue: 2; Journal ID: ISSN 0031-9007
Publisher:
American Physical Society (APS)
Country of Publication:
United States
Language:
English
Subject:
Physics

Citation Formats

Gallagher, J. C., Meng, K. Y., Brangham, J. T., Wang, H. L., Esser, B. D., McComb, D. W., and Yang, F. Y. Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films. United States: N. p., 2017. Web. doi:10.1103/physrevlett.118.027201.
Gallagher, J. C., Meng, K. Y., Brangham, J. T., Wang, H. L., Esser, B. D., McComb, D. W., & Yang, F. Y. Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films. United States. doi:10.1103/physrevlett.118.027201.
Gallagher, J. C., Meng, K. Y., Brangham, J. T., Wang, H. L., Esser, B. D., McComb, D. W., and Yang, F. Y. Sun . "Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films". United States. doi:10.1103/physrevlett.118.027201.
@article{osti_1536470,
title = {Robust Zero-Field Skyrmion Formation in FeGe Epitaxial Thin Films},
author = {Gallagher, J. C. and Meng, K. Y. and Brangham, J. T. and Wang, H. L. and Esser, B. D. and McComb, D. W. and Yang, F. Y.},
abstractNote = {Not provided.},
doi = {10.1103/physrevlett.118.027201},
journal = {Physical Review Letters},
issn = {0031-9007},
number = 2,
volume = 118,
place = {United States},
year = {2017},
month = {1}
}

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