skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Controlling VUV photon fluxes in pulsed inductively coupled Ar/Cl 2 plasmas and potential applications in plasma etching

Abstract

Not provided.

Authors:
;
Publication Date:
Research Org.:
Univ. of Michigan, Ann Arbor, MI (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1535524
DOE Contract Number:  
SC0014132
Resource Type:
Journal Article
Journal Name:
Plasma Sources Science and Technology
Additional Journal Information:
Journal Volume: 26; Journal Issue: 2; Journal ID: ISSN 1361-6595
Publisher:
IOP Publishing
Country of Publication:
United States
Language:
English
Subject:
Physics

Citation Formats

Tian, Peng, and Kushner, Mark J. Controlling VUV photon fluxes in pulsed inductively coupled Ar/Cl 2 plasmas and potential applications in plasma etching. United States: N. p., 2017. Web. doi:10.1088/1361-6595/26/2/024005.
Tian, Peng, & Kushner, Mark J. Controlling VUV photon fluxes in pulsed inductively coupled Ar/Cl 2 plasmas and potential applications in plasma etching. United States. doi:10.1088/1361-6595/26/2/024005.
Tian, Peng, and Kushner, Mark J. Thu . "Controlling VUV photon fluxes in pulsed inductively coupled Ar/Cl 2 plasmas and potential applications in plasma etching". United States. doi:10.1088/1361-6595/26/2/024005.
@article{osti_1535524,
title = {Controlling VUV photon fluxes in pulsed inductively coupled Ar/Cl 2 plasmas and potential applications in plasma etching},
author = {Tian, Peng and Kushner, Mark J.},
abstractNote = {Not provided.},
doi = {10.1088/1361-6595/26/2/024005},
journal = {Plasma Sources Science and Technology},
issn = {1361-6595},
number = 2,
volume = 26,
place = {United States},
year = {2017},
month = {1}
}