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Title: The Existence of Non-negatively Charged Dust Particles in Nonthermal Plasmas

Journal Article · · Plasma Chemistry and Plasma Processing
; ; ;

Not provided.

Research Organization:
Univ. of Michigan, Ann Arbor, MI (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
DOE Contract Number:
SC0001939
OSTI ID:
1533385
Journal Information:
Plasma Chemistry and Plasma Processing, Vol. 37, Issue 3; ISSN 0272-4324
Publisher:
Springer
Country of Publication:
United States
Language:
English

References (25)

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Experimental evidence for nanoparticle deposition in continuous argon–silane plasmas: Effects of silicon nanoparticles on film properties
  • Roca i. Cabarrocas, Pere; Gay, Patrick; Hadjadj, Aomar
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 14, Issue 2 https://doi.org/10.1116/1.580162
journal March 1996
Controlled Fluxes of Silicon Nanoparticles to a Substrate in Pulsed Radio-Frequency Argon–Silane Plasmas journal October 2016
Selective nanoparticle heating: Another form of nonequilibrium in dusty plasmas journal February 2009
Plasma-induced crystallization of silicon nanoparticles journal January 2014

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