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Title: Controlled Fluxes of Silicon Nanoparticles to a Substrate in Pulsed Radio-Frequency Argon–Silane Plasmas

Abstract

Not provided.

Authors:
;
Publication Date:
Research Org.:
Univ. of Michigan, Ann Arbor, MI (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1533384
DOE Contract Number:  
SC0001939
Resource Type:
Journal Article
Journal Name:
Plasma Chemistry and Plasma Processing
Additional Journal Information:
Journal Volume: 37; Journal Issue: 1; Journal ID: ISSN 0272-4324
Publisher:
Springer
Country of Publication:
United States
Language:
English
Subject:
Engineering; Physics

Citation Formats

Larriba-Andaluz, Carlos, and Girshick, Steven L. Controlled Fluxes of Silicon Nanoparticles to a Substrate in Pulsed Radio-Frequency Argon–Silane Plasmas. United States: N. p., 2016. Web. doi:10.1007/s11090-016-9749-7.
Larriba-Andaluz, Carlos, & Girshick, Steven L. Controlled Fluxes of Silicon Nanoparticles to a Substrate in Pulsed Radio-Frequency Argon–Silane Plasmas. United States. doi:10.1007/s11090-016-9749-7.
Larriba-Andaluz, Carlos, and Girshick, Steven L. Mon . "Controlled Fluxes of Silicon Nanoparticles to a Substrate in Pulsed Radio-Frequency Argon–Silane Plasmas". United States. doi:10.1007/s11090-016-9749-7.
@article{osti_1533384,
title = {Controlled Fluxes of Silicon Nanoparticles to a Substrate in Pulsed Radio-Frequency Argon–Silane Plasmas},
author = {Larriba-Andaluz, Carlos and Girshick, Steven L.},
abstractNote = {Not provided.},
doi = {10.1007/s11090-016-9749-7},
journal = {Plasma Chemistry and Plasma Processing},
issn = {0272-4324},
number = 1,
volume = 37,
place = {United States},
year = {2016},
month = {10}
}