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Title: Enhanced plasmon-mediated photo-assisted hydrogen evolution on silicon by interfacial modification

Abstract

Not provided.

Authors:
; ; ;
Publication Date:
Research Org.:
California Inst. of Technology (CalTech), Pasadena, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1533346
DOE Contract Number:  
SC0004993
Resource Type:
Journal Article
Journal Name:
Journal of Applied Electrochemistry
Additional Journal Information:
Journal Volume: 47; Journal Issue: 4; Journal ID: ISSN 0021-891X
Publisher:
Springer
Country of Publication:
United States
Language:
English
Subject:
Electrochemistry

Citation Formats

Bouabadi, B., Aggour, M., Lewerenz, H. -J., and Lublow, M. Enhanced plasmon-mediated photo-assisted hydrogen evolution on silicon by interfacial modification. United States: N. p., 2017. Web. doi:10.1007/s10800-017-1055-4.
Bouabadi, B., Aggour, M., Lewerenz, H. -J., & Lublow, M. Enhanced plasmon-mediated photo-assisted hydrogen evolution on silicon by interfacial modification. United States. doi:10.1007/s10800-017-1055-4.
Bouabadi, B., Aggour, M., Lewerenz, H. -J., and Lublow, M. Thu . "Enhanced plasmon-mediated photo-assisted hydrogen evolution on silicon by interfacial modification". United States. doi:10.1007/s10800-017-1055-4.
@article{osti_1533346,
title = {Enhanced plasmon-mediated photo-assisted hydrogen evolution on silicon by interfacial modification},
author = {Bouabadi, B. and Aggour, M. and Lewerenz, H. -J. and Lublow, M.},
abstractNote = {Not provided.},
doi = {10.1007/s10800-017-1055-4},
journal = {Journal of Applied Electrochemistry},
issn = {0021-891X},
number = 4,
volume = 47,
place = {United States},
year = {2017},
month = {2}
}

Works referenced in this record:

Solar Water Splitting Cells
journal, November 2010

  • Walter, Michael G.; Warren, Emily L.; McKone, James R.
  • Chemical Reviews, Vol. 110, Issue 11, p. 6446-6473
  • DOI: 10.1021/cr1002326

Light-induced water oxidation at silicon electrodes functionalized with a cobalt oxygen-evolving catalyst
journal, June 2011

  • Pijpers, J. J. H.; Winkler, M. T.; Surendranath, Y.
  • Proceedings of the National Academy of Sciences, Vol. 108, Issue 25
  • DOI: 10.1073/pnas.1106545108

H2 evolution at Si-based metal–insulator–semiconductor photoelectrodes enhanced by inversion channel charge collection and H spillover
journal, May 2013

  • Esposito, Daniel V.; Levin, Igor; Moffat, Thomas P.
  • Nature Materials, Vol. 12, Issue 6
  • DOI: 10.1038/nmat3626

Atomic layer-deposited tunnel oxide stabilizes silicon photoanodes for water oxidation
journal, June 2011

  • Chen, Yi Wei; Prange, Jonathan D.; Dühnen, Simon
  • Nature Materials, Vol. 10, Issue 7
  • DOI: 10.1038/nmat3047

Amorphous TiO2 coatings stabilize Si, GaAs, and GaP photoanodes for efficient water oxidation
journal, May 2014


Semiconductor Electrodes
journal, January 1982

  • Fan, F. -R. F.
  • Journal of The Electrochemical Society, Vol. 129, Issue 7
  • DOI: 10.1149/1.2124229

Photoelectrochemical Hydrogen Evolution Using Si Microwire Arrays
journal, January 2011

  • Boettcher, Shannon W.; Warren, Emily L.; Putnam, Morgan C.
  • Journal of the American Chemical Society, Vol. 133, Issue 5, p. 1216-1219
  • DOI: 10.1021/ja108801m

Using TiO 2 as a Conductive Protective Layer for Photocathodic H 2 Evolution
journal, January 2013

  • Seger, Brian; Pedersen, Thomas; Laursen, Anders B.
  • Journal of the American Chemical Society, Vol. 135, Issue 3
  • DOI: 10.1021/ja309523t

Photoelectrochemical Hydrogen Production of TiO 2 Passivated Pt/Si-Nanowire Composite Photocathode
journal, August 2015

  • Li, Shipu; Zhang, Peng; Song, Xuefeng
  • ACS Applied Materials & Interfaces, Vol. 7, Issue 33
  • DOI: 10.1021/acsami.5b04936

Au–Pt core–shell nanoemitters on silicon for photoelectrochemical solar energy conversion
journal, December 2012


Trends in the Exchange Current for Hydrogen Evolution
journal, January 2005

  • Nørskov, J. K.; Bligaard, T.; Logadottir, A.
  • Journal of The Electrochemical Society, Vol. 152, Issue 3
  • DOI: 10.1149/1.1856988

Plasmonics for improved photovoltaic devices
journal, February 2010

  • Atwater, Harry A.; Polman, Albert
  • Nature Materials, Vol. 9, Issue 3, p. 205-213
  • DOI: 10.1038/nmat2629

Influence of Plasmonic Au Nanoparticles on the Photoactivity of Fe2O3 Electrodes for Water Splitting
journal, January 2011

  • Thimsen, Elijah; Le Formal, Florian; Grätzel, Michael
  • Nano Letters, Vol. 11, Issue 1, p. 35-43
  • DOI: 10.1021/nl1022354

Plasmonic Monitoring of Catalytic Hydrogen Generation by a Single Nanoparticle Probe
journal, December 2011

  • Seo, Daeha; Park, Garam; Song, Hyunjoon
  • Journal of the American Chemical Society, Vol. 134, Issue 2
  • DOI: 10.1021/ja2093663

Combined AFM and Brewster-angle analysis of gradually etched ultrathin SiO2 – Comparison with SRPES results
journal, April 2007


Hydrogen photoevolution at p-type silicon electrodes coated with discontinuous metal layers
journal, August 1987

  • Nakato, Yoshihiro; Yano, Hiroyuki; Nishiura, Shinji
  • Journal of Electroanalytical Chemistry and Interfacial Electrochemistry, Vol. 228, Issue 1-2
  • DOI: 10.1016/0022-0728(87)80100-6

Brewster-angle analysis of native and photoelectrochemically grown silicon oxide nanotopographies
journal, September 2007


Etching of Silicon in NaOH Solutions
journal, January 1993

  • Allongue, P.
  • Journal of The Electrochemical Society, Vol. 140, Issue 4
  • DOI: 10.1149/1.2056189

Etching of Silicon in NaOH Solutions
journal, January 1993

  • Allongue, P.
  • Journal of The Electrochemical Society, Vol. 140, Issue 4
  • DOI: 10.1149/1.2056190

Etching mechanism and atomic structure of H-Si(111) surfaces prepared in NH4F
journal, July 1995


The preparation of flat H–Si(111) surfaces in 40% NH4F revisited
journal, October 2000


Brewster-Angle Variable Polarization Spectroscopy of Colloidal Au-Nanospheres and -Nanorods at the Silicon Surface
journal, March 2012

  • Lublow, Michael; Lu, Yan; Wu, Shuang
  • The Journal of Physical Chemistry C, Vol. 116, Issue 14
  • DOI: 10.1021/jp211015k