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Title: Internal modification of intrinsic and doped silicon using infrared nanosecond laser

Abstract

Not provided.

Authors:
; ; ; ; ;
Publication Date:
Research Org.:
Kansas State Univ., Manhattan, KS (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1533282
DOE Contract Number:  
FG02-86ER13491
Resource Type:
Journal Article
Journal Name:
Applied Physics. A, Materials Science and Processing
Additional Journal Information:
Journal Volume: 122; Journal Issue: 12; Journal ID: ISSN 0947-8396
Publisher:
Springer
Country of Publication:
United States
Language:
English
Subject:
Materials Science; Physics

Citation Formats

Yu, Xiaoming, Wang, Xinya, Chanal, Margaux, Trallero-Herrero, Carlos A., Grojo, David, and Lei, Shuting. Internal modification of intrinsic and doped silicon using infrared nanosecond laser. United States: N. p., 2016. Web. doi:10.1007/s00339-016-0540-7.
Yu, Xiaoming, Wang, Xinya, Chanal, Margaux, Trallero-Herrero, Carlos A., Grojo, David, & Lei, Shuting. Internal modification of intrinsic and doped silicon using infrared nanosecond laser. United States. doi:10.1007/s00339-016-0540-7.
Yu, Xiaoming, Wang, Xinya, Chanal, Margaux, Trallero-Herrero, Carlos A., Grojo, David, and Lei, Shuting. Mon . "Internal modification of intrinsic and doped silicon using infrared nanosecond laser". United States. doi:10.1007/s00339-016-0540-7.
@article{osti_1533282,
title = {Internal modification of intrinsic and doped silicon using infrared nanosecond laser},
author = {Yu, Xiaoming and Wang, Xinya and Chanal, Margaux and Trallero-Herrero, Carlos A. and Grojo, David and Lei, Shuting},
abstractNote = {Not provided.},
doi = {10.1007/s00339-016-0540-7},
journal = {Applied Physics. A, Materials Science and Processing},
issn = {0947-8396},
number = 12,
volume = 122,
place = {United States},
year = {2016},
month = {11}
}

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