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Title: Annealed nanostructured thin film catalyst

Abstract

This disclosure provides methods of making an enhanced activity nanostructured thin film catalyst by radiation annealing, typically laser annealing, typically under inert atmosphere. Typically the inert gas has a residual oxygen level of 100 ppm. Typically the irradiation has an incident energy fluence of at least 30 mJ/mm2. In some embodiments, the radiation annealing is accomplished by laser annealing. In some embodiments, the nanostructured thin film catalyst is provided on a continuous web.

Inventors:
; ; ; ; ;
Publication Date:
Research Org.:
3M Innovative Properties Company, St. Paul, MN (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1532099
Patent Number(s):
8,748,330
Application Number:
13/643,431
Assignee:
3M Innovative Properties Company (St. Paul, MN)
DOE Contract Number:  
FG36-07GO17007
Resource Type:
Patent
Resource Relation:
Patent File Date: 2011-04-26
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY

Citation Formats

Debe, Mark K., Smithson, Robert L. W., Studiner, IV, Charles J., Hendricks, Susan M., Kurkowski, Michael J., and Steinbach, Andrew J. L. Annealed nanostructured thin film catalyst. United States: N. p., 2014. Web.
Debe, Mark K., Smithson, Robert L. W., Studiner, IV, Charles J., Hendricks, Susan M., Kurkowski, Michael J., & Steinbach, Andrew J. L. Annealed nanostructured thin film catalyst. United States.
Debe, Mark K., Smithson, Robert L. W., Studiner, IV, Charles J., Hendricks, Susan M., Kurkowski, Michael J., and Steinbach, Andrew J. L. Tue . "Annealed nanostructured thin film catalyst". United States. https://www.osti.gov/servlets/purl/1532099.
@article{osti_1532099,
title = {Annealed nanostructured thin film catalyst},
author = {Debe, Mark K. and Smithson, Robert L. W. and Studiner, IV, Charles J. and Hendricks, Susan M. and Kurkowski, Michael J. and Steinbach, Andrew J. L.},
abstractNote = {This disclosure provides methods of making an enhanced activity nanostructured thin film catalyst by radiation annealing, typically laser annealing, typically under inert atmosphere. Typically the inert gas has a residual oxygen level of 100 ppm. Typically the irradiation has an incident energy fluence of at least 30 mJ/mm2. In some embodiments, the radiation annealing is accomplished by laser annealing. In some embodiments, the nanostructured thin film catalyst is provided on a continuous web.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2014},
month = {6}
}

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