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Doped nanoparticle-based semiconductor junction

Patent ·
OSTI ID:1531828

A doped semiconductor junction for use in an electronic device and a method for making such junction is disclosed. The junction includes a first polycrystalline semiconductor layer doped with donors or acceptors over a substrate such that the first doped semiconductor layer has a first polarity, the first layer including fused semiconductor nanoparticles; and a second layer in contact with the first semiconductor layer over a substrate to form the semiconductor junction.

Research Organization:
Eastman Kodak Company, Rochester, NY (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
FC26-06NT42864
Assignee:
Eastman Kodak Company (Rochester, NY)
Patent Number(s):
7,605,062
Application Number:
11/678,734
OSTI ID:
1531828
Country of Publication:
United States
Language:
English

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