Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers

Branton, Daniel; Golovchenko, Jene A.; King, Gavin M.; MoberlyChan, Warren J.; Schrmann, Gregor M.

Title: Lift-off patterning processing employing energetically-stimulated local removal of solid-condensed-gas layers

Patent · Tue Apr 28 00:00:00 EDT 2009

OSTI ID:1531586

Branton, Daniel; Golovchenko, Jene A.; King, Gavin M.; MoberlyChan, Warren J.; Schrmann, Gregor M.

The invention provides a method for forming a patterned material layer on a structure, by condensing a vapor to a solid condensate layer on a surface of the structure and then localized removal of selected regions of the condensate layer by directing a beam of energy at the selected regions, exposing the structure at the selected regions. A material layer is then deposited on top of the solid condensate layer and the exposed structure at the selected regions. Then the solid condensate layer and regions of the material layer that were deposited on the solid condensate layer are removed, leaving a patterned material layer on the structure.

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Research Organization:: Harvard Univ., Cambridge, MA (United States)

Sponsoring Organization:: USDOE

DOE Contract Number:: FG02-01ER45922

Assignee:: President and Fellows of Harvard College (Cambridge, MA)

Patent Number(s):: 7,524,431

Application Number:: 11/008,438

OSTI ID:: 1531586

Resource Relation:: Patent File Date: 2004-12-09

Country of Publication:: United States

Language:: English

References (15)

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Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers Golovchenko, Jene A.; King, Gavin M.; Schurmann, Gregor M. https://doi.org/https://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/7993538 US Patent Document 7,993,538	patent	August 2011
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