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Method of making and structure of multilayer laue lens for focusing hard x-rays

Patent ·
OSTI ID:1531570

A zone plate multilayer structure includes a substrate carrying a plurality of alternating layers respectively formed of tungsten silicide (WSi2) and silicon (Si). The alternating layers are sequentially deposited precisely controlling a thickness of each layer from a minimum thickness of a first deposited layer adjacent the substrate to a maximum thickness of a last deposited layer. The first minimum thickness layer has a selected thickness of less than or equal to 5 nm with the thickness of the alternating layers monotonically increasing to provide a zone plate multilayer structure having a thickness of greater than 12 μm (microns). The x-rays are diffracted in Laue transmission geometry by the specific arrangement of silicon and tungsten silicide.

Research Organization:
Argonne National Laboratory (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC02-06CH11357; W-31109-ENG-38
Assignee:
UChicago Argonne, LLC (Chicago, IL)
Patent Number(s):
7,440,546
Application Number:
11/634,681
OSTI ID:
1531570
Country of Publication:
United States
Language:
English

References (3)

Multilayer Laue lenses as high-resolution x-ray optics
  • Maser, Joerg; Stephenson, Gregory B.; Vogt, Stefan
  • Optical Science and Technology, the SPIE 49th Annual Meeting, SPIE Proceedings https://doi.org/10.1117/12.560046
conference November 2004
Depth-graded multilayers for application in transmission geometry as linear zone plates journal December 2005
X-ray multilayer coatings for use at energies above 100 keV conference July 2000