Photo-definable self-assembled materials
Patent
·
OSTI ID:1531549
The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: at least one photoactivator generator, at least one material capable of being sol-gel processed; and exposing the film to light to form a patterned mesoporous material.
- Research Organization:
- STC.UNM, Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- BF-4277
- Assignee:
- STC.UNM (Albuquerque, NM)
- Patent Number(s):
- 7,332,264
- Application Number:
- 10/373,565
- OSTI ID:
- 1531549
- Resource Relation:
- Patent File Date: 2003-02-26
- Country of Publication:
- United States
- Language:
- English
Photo-definable self-assembled materials
|
patent | October 2004 |
Process for photoinitiated control of inorganic network formation in the sol-gel process
|
patent | November 1994 |
Synthetic mesoporous crystaline material
|
patent | March 1992 |
Method for synthesizing mesoporous crystalline material
|
patent | October 1991 |
Similar Records
Photo-Definable Self Assembled Maerials
Rapid Prototyping of Patterned Multifunctional Nanostructures
Patternable Mesoporous Thin Film Quantum Materials via Block Copolymer Self-Assembly: An Emergent Technology?
Patent
·
Tue Oct 26 00:00:00 EDT 2004
·
OSTI ID:1531549
Rapid Prototyping of Patterned Multifunctional Nanostructures
Conference
·
Tue Jul 18 00:00:00 EDT 2000
·
OSTI ID:1531549
+1 more
Patternable Mesoporous Thin Film Quantum Materials via Block Copolymer Self-Assembly: An Emergent Technology?
Journal Article
·
Mon Jul 19 00:00:00 EDT 2021
· ACS Applied Materials and Interfaces
·
OSTI ID:1531549
+6 more