Photo-definable self-assembled materials
Patent
·
OSTI ID:1531549
The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: at least one photoactivator generator, at least one material capable of being sol-gel processed; and exposing the film to light to form a patterned mesoporous material.
- Research Organization:
- STC.UNM, Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE
- Assignee:
- STC.UNM (Albuquerque, NM)
- Patent Number(s):
- 7,332,264
- Application Number:
- 10/373,565
- OSTI ID:
- 1531549
- Country of Publication:
- United States
- Language:
- English
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