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Title: Photo-definable self-assembled materials

Patent ·
OSTI ID:1531549

The present invention provides a mesoporous material comprising at least one region of mesoporous material patterned at a lithographic scale. The present invention also provides a method for forming a patterned mesoporous material comprising: coating a sol on a substrate to form a film, the sol comprising: at least one photoactivator generator, at least one material capable of being sol-gel processed; and exposing the film to light to form a patterned mesoporous material.

Research Organization:
STC.UNM, Albuquerque, NM (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
BF-4277
Assignee:
STC.UNM (Albuquerque, NM)
Patent Number(s):
7,332,264
Application Number:
10/373,565
OSTI ID:
1531549
Resource Relation:
Patent File Date: 2003-02-26
Country of Publication:
United States
Language:
English

References (4)


Cited By (10)

Forming photovoltaic conductive features from multiple inks patent February 2013
Cell-based composite materials with programmed structures and functions patent May 2018
Cell-based composite materials with programmed structures and functions patent March 2016
Shape-preserving transformations of organic matter and compositions thereof patent June 2018
Photosensitive self-assembled monolayer for selective placement of hydrophilic structures patent June 2010
Photosensitive self-assembled monolayer for selective placement of hydrophilic structures patent February 2011
Photosensitive self-assembled monolayer for selective placement of hydrophilic structures patent November 2011
Synthesis of porphyrin nanostructures patent October 2014
Photosensitive self-assembled monolayer for selective placement of hydrophilic structures patent July 2012
Processes for forming photovoltaic conductive features from multiple inks patent January 2012

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