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Methods and apparatus for forming submicron patterns on films

Patent ·
OSTI ID:1531505
; ; ; ;

A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and defining an interface there between; applying an electric field to the interface for a time sufficient to produce a structure in the first flowable medium along the interface: and hardening the structure in the first flowable medium to form the patterned film.

Research Organization:
Univ. Konstanz (Germany); Univ. of Massachusetts, Boston, MA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
FG02-96ER45612
Assignee:
Universitat Konstanz (DE); University of Massachusetts (Boston, MA)
Patent Number(s):
7,014,786
Application Number:
10/144,961
OSTI ID:
1531505
Country of Publication:
United States
Language:
English

References (5)

Dispersion-Driven Morphology of Mechanically Confined Polymer Films journal February 1999
Surface-induced structure formation of polymer blends on patterned substrates journal February 1998
NANOTECHNOLOGY:Patterning Plastic With Plentiful Pillars journal November 1999
Electric field induced pattern formation in interfacial metal colloid films journal November 1993
Lithographically induced self-construction of polymer microstructures for resistless patterning journal August 1999

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36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY