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Title: Modeling Strain Distribution at the Atomic Level in Doped Ceria Films with Extended X-ray Absorption Fine Structure Spectroscopy

Authors:
; ; ; ; ; ;  [1]
  1. WIS-I
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States). Advanced Photon Source (APS)
Sponsoring Org.:
NSFFOREIGN
OSTI Identifier:
1531012
Resource Type:
Journal Article
Journal Name:
Inorg. Chem.
Additional Journal Information:
Journal Volume: 58; Journal Issue: (11) ; 05, 2019
Country of Publication:
United States
Language:
ENGLISH

Citation Formats

Kraynis, Olga, Timoshenko, Janis, Huang, Jiahao, Singh, Harishchandra, Wachtel, Ellen, Frenkel, Anatoly I., Lubomirsky, Igor, and SBU). Modeling Strain Distribution at the Atomic Level in Doped Ceria Films with Extended X-ray Absorption Fine Structure Spectroscopy. United States: N. p., 2019. Web. doi:10.1021/acs.inorgchem.9b00730.
Kraynis, Olga, Timoshenko, Janis, Huang, Jiahao, Singh, Harishchandra, Wachtel, Ellen, Frenkel, Anatoly I., Lubomirsky, Igor, & SBU). Modeling Strain Distribution at the Atomic Level in Doped Ceria Films with Extended X-ray Absorption Fine Structure Spectroscopy. United States. doi:10.1021/acs.inorgchem.9b00730.
Kraynis, Olga, Timoshenko, Janis, Huang, Jiahao, Singh, Harishchandra, Wachtel, Ellen, Frenkel, Anatoly I., Lubomirsky, Igor, and SBU). Mon . "Modeling Strain Distribution at the Atomic Level in Doped Ceria Films with Extended X-ray Absorption Fine Structure Spectroscopy". United States. doi:10.1021/acs.inorgchem.9b00730.
@article{osti_1531012,
title = {Modeling Strain Distribution at the Atomic Level in Doped Ceria Films with Extended X-ray Absorption Fine Structure Spectroscopy},
author = {Kraynis, Olga and Timoshenko, Janis and Huang, Jiahao and Singh, Harishchandra and Wachtel, Ellen and Frenkel, Anatoly I. and Lubomirsky, Igor and SBU)},
abstractNote = {},
doi = {10.1021/acs.inorgchem.9b00730},
journal = {Inorg. Chem.},
number = (11) ; 05, 2019,
volume = 58,
place = {United States},
year = {2019},
month = {7}
}