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Title: Optimal contact photolithography technqiues for HEMT substrates using I-line photoresist.

Abstract

Abstract not provided.

Authors:
; ; ; ; ;
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1524261
Report Number(s):
SAND2018-4965C
663506
DOE Contract Number:  
AC04-94AL85000
Resource Type:
Conference
Resource Relation:
Conference: Proposed for presentation at the 65th Annual AVS conference held October 21 - May 26, 2018 in Long Beach, California, United States.
Country of Publication:
United States
Language:
English

Citation Formats

Jones, Adam, Klein, Brianna Alexandra, Baca, Albert, Armstrong, Andrew, Allerman, Andrew A., and Douglas, Erica Ann. Optimal contact photolithography technqiues for HEMT substrates using I-line photoresist.. United States: N. p., 2018. Web.
Jones, Adam, Klein, Brianna Alexandra, Baca, Albert, Armstrong, Andrew, Allerman, Andrew A., & Douglas, Erica Ann. Optimal contact photolithography technqiues for HEMT substrates using I-line photoresist.. United States.
Jones, Adam, Klein, Brianna Alexandra, Baca, Albert, Armstrong, Andrew, Allerman, Andrew A., and Douglas, Erica Ann. Tue . "Optimal contact photolithography technqiues for HEMT substrates using I-line photoresist.". United States. https://www.osti.gov/servlets/purl/1524261.
@article{osti_1524261,
title = {Optimal contact photolithography technqiues for HEMT substrates using I-line photoresist.},
author = {Jones, Adam and Klein, Brianna Alexandra and Baca, Albert and Armstrong, Andrew and Allerman, Andrew A. and Douglas, Erica Ann},
abstractNote = {Abstract not provided.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2018},
month = {5}
}

Conference:
Other availability
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