Plasma Emission Characteristics in Laser Induced Breakdown Spectroscopy of Silicon with Mid-Infrared, Multi-Millijoule, Nanosecond Laser Pulses from a Ho:YLF Excitation Source

Kupfer, Rotem; Quevedo, Hernan; Smith, Herbie; Ha, Thanh; Yandow, Andrew; Tiwari, Ganesh; Richmond, Christopher Grant; Fang, Li; Hegelich, Bjorn Manuel

doi:10.1364/AO.58.004592

Title: Plasma Emission Characteristics in Laser Induced Breakdown Spectroscopy of Silicon with Mid-Infrared, Multi-Millijoule, Nanosecond Laser Pulses from a Ho:YLF Excitation Source

Journal Article · Tue Jun 04 00:00:00 EDT 2019 · Applied Optics

DOI:https://doi.org/10.1364/AO.58.004592· OSTI ID:1513210

^[1]; Quevedo, Hernan ^[1]; Smith, Herbie ^[1]; Ha, Thanh ^[1]; Yandow, Andrew ^[1]; Tiwari, Ganesh ^[1]; Richmond, Christopher Grant ^[1]; Fang, Li ^[1]; Hegelich, Bjorn Manuel ^[2]

Univ. of Texas, Austin, TX (United States). Center for High Energy Density Science. Dept. of Physics
Univ. of Texas, Austin, TX (United States). Center for High Energy Density Science. Dept. of Physics; Inst. for Basic Science, Gwangju (Korea, Republic of)

Here, we characterized the plasma emission produced by the interaction of multimilijoule, 40 ns duration, mid-infrared laser pulses with a silicon surface. The laser pulses were produced by a Q-switched Ho:YLF master oscillator power amplifier system. Using spectral measurements and a framing camera we observed a spatial separation of the plasma plume, increased emission signal with low white light generation, and a drop in the time- and space-averaged apparent plasma density with increasing pump energy. Our findings can be explained by continuous heating of the plasma by the pump pulse due to the more efficient inverse bremsstrahlung absorption at longer wavelengths.

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Research Organization:: Univ. of Texas, Austin, TX (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA); Defense Advanced Research Projects Agency (DARPA) (United States)

Grant/Contract Number:: NA0002008; 12-63-PULSE-FP014

OSTI ID:: 1513210

Alternate ID(s):: OSTI ID: 1524123

Journal Information:: Applied Optics, Vol. 58, Issue 17; ISSN 1559-128X

Publisher:: Optical Society of AmericaCopyright Statement

Country of Publication:: United States

Language:: English

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Title: Plasma Emission Characteristics in Laser Induced Breakdown Spectroscopy of Silicon with Mid-Infrared, Multi-Millijoule, Nanosecond Laser Pulses from a Ho:YLF Excitation Source

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