Microstructure tuning facilitated photo-efficiency enhancement and environmental benign nature of HfO2/Mo/HfO2 multilayer films

Journal Article · Tue May 15 00:00:00 EDT 2018 · Solar Energy

DOI:https://doi.org/10.1016/j.solener.2017.12.021· OSTI ID:1512862

Dubey, P ^[1]; Gomez, J ^[1]; Manandhar, Sandeep  ^[2]; Shutthanandan, Vaithiyalingam  ^[3]; Ramana, C.V. ^[1]

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1. University of Texas at El Paso
2. UNIVERSITY OF TEXAS
3. BATTELLE (PACIFIC NW LAB)

Nano-layered, multilayered ?lms consisting of HfO2(dielectric)/Mo(metal)/HfO2(dielectric), (D/M/D archi-tecture) with controlled layer thickness, chemistry and microstructure were demonstrated for e?cient utiliza-tion of solar energy with well-designated spectral control. The e?ect of Mo metal interlayer on the energy performance and e?ciency of HfO2/Mo/HfO2 multilayer ?lms made by electron-beam deposition onto silicon and glass substrates has been evaluated. The Mo interlayer thickness [Mo(t)] was varied in the range of 5–25 nm while the top/bottom HfO2 layer thickness was kept constant at ~50 nm. Structural, morphological and optical characterization was performed to understand the e?ect of Mo(t) induced microstructure on mechanical dur-ability and optical behavior of the D/M/D multilayer ?lms. Structural studies revealed that D/M/D multilayer ?lms with relatively low Mo(t) were amorphous, while higher Mo(t) induces the amorphous-to-nanocrystalline microstructure transformation, which also induces surface roughening e?ects. The D/M/D multilayer ?lm with Mo(t) = 20 nm, where the nano-columnar morphology of the D-M-D layers are aligned perpendicular to the substrate surface and exhibits the optimum spectral selectivity. Such microstructure and morphological tailoring also facilitates the environmentally friendly (self-cleaning/stain repellent) nature of these multilayer ?lms by the high contact angle (~102°) achieved. Molybdenum interlayer facilitated higher contact angle leads to super-hydrophobic nature of the HfO2/Mo/HfO2 multilayered ?lm surfaces. The low surface roughness values (0.2–0.8 nm), which are primarily due to Mo at the interface, of the HfO2/Mo/HfO2 multilayered ?lms satisfy the general requirements of heat mirror applications. In addition, the microstructure of intermediate Mo layer and HfO2-Mo interfaces signi?cantly control the mechanical properties of D/M/D multilayer ?lms. Optimal me-chanical properties (hardness = 30 GPa, elastic modulus = 312 GPa, wear resistance = 0.094, adhesion strength = 2050 µN) have been obtained for Mo(t) = 20 nm D/M/D multilayer ?lm. The mechanical response strongly supports ?exible and wear resistive nature of HfO2/Mo/HfO2 multilayer ?lms.

• Research Organization: Pacific Northwest National Lab. (PNNL), Richland, WA (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: AC05-76RL01830
• OSTI ID: 1512862
• Report Number(s): PNNL-SA-134485
• Journal Information: Solar Energy, Vol. 166
• Country of Publication: United States
• Language: English