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Title: Communication—Light-Induced Plating of Aluminum on Silicon in a Lewis Acidic Chloroaluminate Ionic Liquid

Abstract

Conventional electroplating of aluminum on silicon often requires a seed layer to overcome the high resistivity of the substrate. In this paper, light-induced plating of aluminum directly on a silicon substrate in an ionic liquid is reported. Without any seed layer, the deposited aluminum has good adhesion to the silicon surface. The resistivity of the aluminum deposits is as low as 4 × 10 -6 Ω-cm, which is only about 1.5 times that of bulk aluminum. The suitable wavelength for the light source is 600 nm to 1,000 nm. The effect of plating temperature on morphology of the aluminum deposits is analyzed.

Authors:
 [1];  [1];  [1];  [1];  [2]; ORCiD logo [2]
  1. Arizona State Univ., Tempe, AZ (United States)
  2. Wuhan Univ. (China)
Publication Date:
Research Org.:
Arizona State Univ., Tempe, AZ (United States)
Sponsoring Org.:
USDOE Office of Energy Efficiency and Renewable Energy (EERE), Solar Energy Technologies Office (EE-4S)
OSTI Identifier:
1509874
Grant/Contract Number:  
EE0008150
Resource Type:
Journal Article: Accepted Manuscript
Journal Name:
Journal of the Electrochemical Society
Additional Journal Information:
Journal Volume: 165; Journal Issue: 9; Journal ID: ISSN 0013-4651
Publisher:
The Electrochemical Society
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; Aluminum; Ionic liquid; Light-induced plating

Citation Formats

Wang, Laidong, Huang, Wen-Hsi, Shin, Woo Jung, Tao, Meng, Deng, Bowen, and Wang, Dihua. Communication—Light-Induced Plating of Aluminum on Silicon in a Lewis Acidic Chloroaluminate Ionic Liquid. United States: N. p., 2018. Web. doi:10.1149/2.0731809jes.
Wang, Laidong, Huang, Wen-Hsi, Shin, Woo Jung, Tao, Meng, Deng, Bowen, & Wang, Dihua. Communication—Light-Induced Plating of Aluminum on Silicon in a Lewis Acidic Chloroaluminate Ionic Liquid. United States. doi:10.1149/2.0731809jes.
Wang, Laidong, Huang, Wen-Hsi, Shin, Woo Jung, Tao, Meng, Deng, Bowen, and Wang, Dihua. Fri . "Communication—Light-Induced Plating of Aluminum on Silicon in a Lewis Acidic Chloroaluminate Ionic Liquid". United States. doi:10.1149/2.0731809jes. https://www.osti.gov/servlets/purl/1509874.
@article{osti_1509874,
title = {Communication—Light-Induced Plating of Aluminum on Silicon in a Lewis Acidic Chloroaluminate Ionic Liquid},
author = {Wang, Laidong and Huang, Wen-Hsi and Shin, Woo Jung and Tao, Meng and Deng, Bowen and Wang, Dihua},
abstractNote = {Conventional electroplating of aluminum on silicon often requires a seed layer to overcome the high resistivity of the substrate. In this paper, light-induced plating of aluminum directly on a silicon substrate in an ionic liquid is reported. Without any seed layer, the deposited aluminum has good adhesion to the silicon surface. The resistivity of the aluminum deposits is as low as 4 × 10-6 Ω-cm, which is only about 1.5 times that of bulk aluminum. The suitable wavelength for the light source is 600 nm to 1,000 nm. The effect of plating temperature on morphology of the aluminum deposits is analyzed.},
doi = {10.1149/2.0731809jes},
journal = {Journal of the Electrochemical Society},
issn = {0013-4651},
number = 9,
volume = 165,
place = {United States},
year = {2018},
month = {6}
}

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Works referenced in this record:

Electrodeposition of aluminium in aluminium chloride/1-methyl-3-ethylimidazolium chloride
journal, July 1988

  • Lai, P. K.; Skyllas-Kazacos, M.
  • Journal of Electroanalytical Chemistry and Interfacial Electrochemistry, Vol. 248, Issue 2, p. 431-440
  • DOI: 10.1016/0022-0728(88)85103-9

Nucleation and Morphology Studies of Aluminum Deposited from an Ambient‐Temperature Chloroaluminate Molten Salt
journal, January 1992

  • Carlin, Richard T.; Crawford, Wayne; Bersch, Michael
  • Journal of The Electrochemical Society, Vol. 139, Issue 10, p. 2720-2727
  • DOI: 10.1149/1.2068970