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Title: Cryogenic characterization of titanium nitride thin films

Authors:
ORCiD logo; ; ; ORCiD logo; ORCiD logo; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1505675
Grant/Contract Number:  
SC0007117
Resource Type:
Journal Article: Published Article
Journal Name:
Optical Materials Express
Additional Journal Information:
Journal Name: Optical Materials Express Journal Volume: 9 Journal Issue: 5; Journal ID: ISSN 2159-3930
Publisher:
Optical Society of America
Country of Publication:
United States
Language:
English

Citation Formats

Vertchenko, Larissa, Leandro, Lorenzo, Shkondin, Evgeniy, Takayama, Osamu, Bondarev, Igor V., Akopian, Nika, and Lavrinenko, Andrei V. Cryogenic characterization of titanium nitride thin films. United States: N. p., 2019. Web. doi:10.1364/OME.9.002117.
Vertchenko, Larissa, Leandro, Lorenzo, Shkondin, Evgeniy, Takayama, Osamu, Bondarev, Igor V., Akopian, Nika, & Lavrinenko, Andrei V. Cryogenic characterization of titanium nitride thin films. United States. doi:10.1364/OME.9.002117.
Vertchenko, Larissa, Leandro, Lorenzo, Shkondin, Evgeniy, Takayama, Osamu, Bondarev, Igor V., Akopian, Nika, and Lavrinenko, Andrei V. Mon . "Cryogenic characterization of titanium nitride thin films". United States. doi:10.1364/OME.9.002117.
@article{osti_1505675,
title = {Cryogenic characterization of titanium nitride thin films},
author = {Vertchenko, Larissa and Leandro, Lorenzo and Shkondin, Evgeniy and Takayama, Osamu and Bondarev, Igor V. and Akopian, Nika and Lavrinenko, Andrei V.},
abstractNote = {},
doi = {10.1364/OME.9.002117},
journal = {Optical Materials Express},
issn = {2159-3930},
number = 5,
volume = 9,
place = {United States},
year = {2019},
month = {4}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record at 10.1364/OME.9.002117

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Works referenced in this record:

Low-Loss Plasmonic Metamaterials
journal, January 2011


Pursuing Near-Zero Response
journal, April 2013