Scanning microwave imaging of optically patterned Ge2Sb2Te5
- Stanford Univ., Stanford, CA (United States)
- SLAC National Accelerator Lab., Menlo Park, CA (United States)
- SLAC National Accelerator Lab., Menlo Park, CA (United States); Univ. of Ottawa, Ottawa, ON (Canada)
- SLAC National Accelerator Lab., Menlo Park, CA (United States); European XFEL, Schenefeld (Germany)
The measurement of inhomogeneous conductivity in optically crystallized, amorphous Ge2Sb2Te5 (GST) films is demonstrated via scanning microwave impedance microscopy (MIM). Qualitative consistency with expectations is demonstrated in spots crystallized by focused coherent light at various intensities, exposure times, and film thicknesses. The characterization of process imperfections is demonstrated when a mask is used to optically pattern the nanoscale features of crystalline GST in the amorphous film. In conclusion, these measurements show the ability of MIM to resolve partial crystallization, patterning faults, and other details in optically patterned GST.
- Research Organization:
- SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States)
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- AC02-76SF00515; DMR1305731; GBMF4536
- OSTI ID:
- 1504493
- Journal Information:
- Applied Physics Letters, Vol. 114, Issue 9; ISSN 0003-6951
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 3 works
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