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Title: RESIDUAL-GAS-IONIZATION BEAM PROFILE MONITORS IN RHIC.

Abstract

Four ionization profile monitors (IPMs) in RHIC measure vertical and horizontal beam profiles in the two rings by measuring the distribution of electrons produced by beam ionization of residual gas. During the last three years both the collection accuracy and signal/noise ratio have been improved. An electron source is mounted across the beam pipe from the collector to monitor microchannel plate (MCP) aging and the signal electrons are gated to reduce MCP aging and to allow charge replenishment between single-turn measurements. Software changes permit simultaneous measurements of any number of individual bunches in the ring. This has been used to measure emittance growth rates on six bunches of varying intensities in a single store. Also the software supports FFT analysis of turn-by-turn profiles of a single bunch at injection to detect dipole and quadrupole oscillations.

Authors:
; ;
Publication Date:
Research Org.:
BROOKHAVEN NATIONAL LABORATORY (US)
Sponsoring Org.:
DOE/SC (US)
OSTI Identifier:
15016107
Report Number(s):
BNL-73451-2005-CP
R&D Project: AD-003; KB-0202011; TRN: US0501932
DOE Contract Number:  
AC02-98CH10886
Resource Type:
Conference
Resource Relation:
Conference: PAC 2005 PARTICLE ACCELERATOR CONFERENCE, KNOXVILLE, TN (US), 05/16/2005--05/20/2005; Other Information: PBD: 16 May 2005
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; ACCELERATORS; ACCURACY; AGING; BEAM PROFILES; DIPOLES; DISTRIBUTION; ELECTRON SOURCES; ELECTRONS; IONIZATION; MONITORS; OSCILLATIONS; PLATES; QUADRUPOLES

Citation Formats

CONNOLLY, R, MICHNOFF, R, and TEPIKIAN, S. RESIDUAL-GAS-IONIZATION BEAM PROFILE MONITORS IN RHIC.. United States: N. p., 2005. Web.
CONNOLLY, R, MICHNOFF, R, & TEPIKIAN, S. RESIDUAL-GAS-IONIZATION BEAM PROFILE MONITORS IN RHIC.. United States.
CONNOLLY, R, MICHNOFF, R, and TEPIKIAN, S. 2005. "RESIDUAL-GAS-IONIZATION BEAM PROFILE MONITORS IN RHIC.". United States. https://www.osti.gov/servlets/purl/15016107.
@article{osti_15016107,
title = {RESIDUAL-GAS-IONIZATION BEAM PROFILE MONITORS IN RHIC.},
author = {CONNOLLY, R and MICHNOFF, R and TEPIKIAN, S},
abstractNote = {Four ionization profile monitors (IPMs) in RHIC measure vertical and horizontal beam profiles in the two rings by measuring the distribution of electrons produced by beam ionization of residual gas. During the last three years both the collection accuracy and signal/noise ratio have been improved. An electron source is mounted across the beam pipe from the collector to monitor microchannel plate (MCP) aging and the signal electrons are gated to reduce MCP aging and to allow charge replenishment between single-turn measurements. Software changes permit simultaneous measurements of any number of individual bunches in the ring. This has been used to measure emittance growth rates on six bunches of varying intensities in a single store. Also the software supports FFT analysis of turn-by-turn profiles of a single bunch at injection to detect dipole and quadrupole oscillations.},
doi = {},
url = {https://www.osti.gov/biblio/15016107}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Mon May 16 00:00:00 EDT 2005},
month = {Mon May 16 00:00:00 EDT 2005}
}

Conference:
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