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Title: A Dual-Mode Actinic EUV Mask Inspection Tool

Abstract

To qualify the performance of non-actinic inspection tools, a novel EUV mask inspection system has been installed at the Advanced Light Source (ALS) synchrotron facility at Lawrence Berkeley National Laboratory. Similar to the older generation actinic mask inspection tool, the new system can operate in scanning mode, when mask blanks are scanned for defects using 13.5-nm in-band radiation to identify and map all locations on the mask that scatter a significant amount of EUV light. By modifying and optimizing beamline optics (11.3.2 at ALS) and replacing K-B focusing mirrors with a high quality Schwarzschild illuminator, the new system achieves an order of magnitude improvement on in-band EUV flux density at the mask, enabling faster scanning speed and higher sensitivity to smaller defects. Moreover, the system can also operate in imaging mode, when it becomes a zone-plate-based full-field EUV microscope with spatial resolution better than 100 nm. The microscope utilizes an off-axis setup, making it possible to obtain bright field images over a field-of-view of 5 x 5 {micro}m.

Authors:
; ; ; ; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab., Livermore, CA (US)
Sponsoring Org.:
US Department of Energy (US)
OSTI Identifier:
15015933
Report Number(s):
UCRL-PROC-210747
Journal ID: ISSN 0277-786X; TRN: US0501669
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Conference
Resource Relation:
Journal Volume: 5751; Conference: Presented at: SPIE Microlithography, San Jose, CA (US), 02/27/2005--03/04/2005; Other Information: PBD: 21 Mar 2005
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ADVANCED LIGHT SOURCE; DEFECTS; FLUX DENSITY; FOCUSING; MICROSCOPES; MIRRORS; OPTICS; PERFORMANCE; RADIATIONS; SENSITIVITY; SPATIAL RESOLUTION; SYNCHROTRONS; VELOCITY

Citation Formats

Liu, Y, Barty, A, Gullikson, E, S Taylor, J, Liddle, J A, and Wood, O. A Dual-Mode Actinic EUV Mask Inspection Tool. United States: N. p., 2005. Web. doi:10.1117/12.598559.
Liu, Y, Barty, A, Gullikson, E, S Taylor, J, Liddle, J A, & Wood, O. A Dual-Mode Actinic EUV Mask Inspection Tool. United States. https://doi.org/10.1117/12.598559
Liu, Y, Barty, A, Gullikson, E, S Taylor, J, Liddle, J A, and Wood, O. Mon . "A Dual-Mode Actinic EUV Mask Inspection Tool". United States. https://doi.org/10.1117/12.598559. https://www.osti.gov/servlets/purl/15015933.
@article{osti_15015933,
title = {A Dual-Mode Actinic EUV Mask Inspection Tool},
author = {Liu, Y and Barty, A and Gullikson, E and S Taylor, J and Liddle, J A and Wood, O},
abstractNote = {To qualify the performance of non-actinic inspection tools, a novel EUV mask inspection system has been installed at the Advanced Light Source (ALS) synchrotron facility at Lawrence Berkeley National Laboratory. Similar to the older generation actinic mask inspection tool, the new system can operate in scanning mode, when mask blanks are scanned for defects using 13.5-nm in-band radiation to identify and map all locations on the mask that scatter a significant amount of EUV light. By modifying and optimizing beamline optics (11.3.2 at ALS) and replacing K-B focusing mirrors with a high quality Schwarzschild illuminator, the new system achieves an order of magnitude improvement on in-band EUV flux density at the mask, enabling faster scanning speed and higher sensitivity to smaller defects. Moreover, the system can also operate in imaging mode, when it becomes a zone-plate-based full-field EUV microscope with spatial resolution better than 100 nm. The microscope utilizes an off-axis setup, making it possible to obtain bright field images over a field-of-view of 5 x 5 {micro}m.},
doi = {10.1117/12.598559},
url = {https://www.osti.gov/biblio/15015933}, journal = {},
issn = {0277-786X},
number = ,
volume = 5751,
place = {United States},
year = {2005},
month = {3}
}

Conference:
Other availability
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